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Aluminum oxide, Al2O3, commonly referred to as alumina, is by far the most common substrate material used in the microelectronics industry because it is superior to most other
oxide ceramics in mechanical, thermal, and electrical properties. The raw materials are
plentiful, low in cost, and amenable to fabrication by a wide variety of techniques into a
wide variety of shapes.
Alumina is hexagonal close-packed with a corundum structure. Several metastable
structures exist, but they all ultimately irreversibly transform to the hexagonal alpha phase.
Alumina is stable in both oxidizing and reducing atmospheres up to1925C. Weight loss
in vacuum over the temperature range 1700C to 2000C ranges from 107 to 106 g/(cm2 s).
It is resistant to attack by all gases except wet fluorine to at least 1700C. Alumina is
attacked at elevated temperatures by alkali metal vapors and halogen acids, especially the
lower-purity alumina compositions that may contain a percentage of glasses.
Alumina is used extensively in the microelectronics industry as a substrate material for
thick- and thin-film circuits, for circuit packages, and as multilayer structures for multichip
modules. Compositions exist for both high- and low-temperature processing. High temperature cofired ceramics (HTCC) use a refractory metal, such as tungsten or molybdenum/
manganese, as a conductor and fire at about 1800C. The circuits are formed as separate
layers, laminated together, and fired as a unit. Low temperature cofired ceramics (LTCC)
use conventional gold or palladium silver as conductors and fire as low as 850C. Certain
power MOSFETs and bipolar transistors are mounted on alumina substrates, which act as
electrical insulators and thermal conductors.
The parameters of alumina are summarized in Table 4.11.
, 1700 .
,
.
, ,
. . () ,
/
, 1800 .
, , .
()
850 .
,
.
4.11.
4.8.2 -
(, ) .
2050 .
. 1100
. ,
.
, ,
.
300 , .
. ,
, .
,
. ,
.
.
99,5 4.12.