Scribd Logo
Importer

Bienvenue sur Scribd !

  • Micro Electronics Technology

    Transféré par

    Stanly Kurian
    13 vues2 pages
    This document appears to be an exam for a course on microelectronic technology. It contains 10 questions testing students' knowledge on various topics related to microelectronics, including: 1. Thermal oxidation species and the lithography process. 2. Concentration profiles of BJT structures and LDD structures for reducing short-channel effects. 3. I-based design rules for metals and pads and different CMOS design styles. 4. Isolation processes for bipolar ICs and briefly explaining ballistic transport models. The questions range from asking students to explain concepts to deriving equations to realizing logic functions using CMOS designs. Diagrams are also required for some answers.

    Description originale:

    Btech question paper july 2014 kannur university

    Titre original

    Micro electronics technology

    Copyright

    © © All Rights Reserved

    Formats disponibles

    PDF, TXT ou lisez en ligne sur Scribd

    Avez-vous trouvé ce document utile ?

    Ce contenu est-il inapproprié ?

    Signaler ce document
    This document appears to be an exam for a course on microelectronic technology. It contains 10 questions testing students' knowledge on various topics related to microelectronics, including: 1. Thermal oxidation species and the lithography process. 2. Concentration profiles of BJT structures and LDD structures for reducing short-channel effects. 3. I-based design rules for metals and pads and different CMOS design styles. 4. Isolation processes for bipolar ICs and briefly explaining ballistic transport models. The questions range from asking students to explain concepts to deriving equations to realizing logic functions using CMOS designs. Diagrams are also required for some answers.

    Droits d'auteur :

    © All Rights Reserved
    Téléchargez comme PDF, TXT ou lisez en ligne sur Scribd
    Signaler comme contenu inapproprié
    13 vues2 pages

    Micro Electronics Technology

    Transféré par

    Stanly Kurian
    This document appears to be an exam for a course on microelectronic technology. It contains 10 questions testing students' knowledge on various topics related to microelectronics, including: 1. Thermal oxidation species and the lithography process. 2. Concentration profiles of BJT structures and LDD structures for reducing short-channel effects. 3. I-based design rules for metals and pads and different CMOS design styles. 4. Isolation processes for bipolar ICs and briefly explaining ballistic transport models. The questions range from asking students to explain concepts to deriving equations to realizing logic functions using CMOS designs. Diagrams are also required for some answers.

    Droits d'auteur :

    © All Rights Reserved
    Téléchargez comme PDF, TXT ou lisez en ligne sur Scribd
    Signaler comme contenu inapproprié
    sur 2

    t

    |ilililfltfiiltilfltil]l
    ll|l
    ilurfi

    f fl\otrrt't
    {-L'.,!';'*f;

    .l-"'::l:'Jlry

    r'--fi

    Reg. No.

    M 25704

    Name:
    Vll Semester B.Tech. Degree (Sup./lmp. - Including Part Time)
    Examination,July 2014
    (2007 Admn. Onwards)
    pT 2K6t2K6 EC 701 - MICROELECTRONICSTeCHTOIOCY
    Max.Marks; 100

    Time: 3 Hours
    PART-A
    andtheiroxidatipn
    L a) Mentionthreethermaloxidation
    species.

    b) Explaintheprocessinvolvedin lithography.
    profileof BJTandexplainitssignificance.
    c) Drawtheconcentration
    reduceshotelectroneffect.
    d) ExplainhowLDDstructures
    e) BrieflydescribeI baseddesignrulesfor metalsandpads.
    f) BrieflydescribeditferentCMOsdesignstyles.
    g) Discussthe isolationprocessof BipolarlC process.
    h) Brieflyexplainballastic
    transportmodel.

    (8x5=40)

    PART-B
    ll. a)

    i\

    theory.
    Explain
    diflusion

    profileofa constant
    sourcediflusion.
    ii) Derive
    theconcentration
    OR
    in thesubstrate
    by ion
    ol impurities
    distribution
    b) i) Explaintheapproximate
    implantation.
    ii) Explainchannelling
    in ionimplantation.
    Bipolarprocesswithneatdiagrams.
    l l l . a ) Explainadvanced

    10
    5
    15

    OR
    b) Explainthe processinvolvedin twintub CMOsprocesswithneatdiagrams. 15
    P.T.O.

    llllllllllllllllllllllllll
    I|llll]llll

    M 25704

    lV. a) i) Realizethe logicfunctionY = A @B usingstaticCMOsdesignstyle'

    8
    7

    ii) DrawitsstickdiagramandEuler'sdiagram.
    OR
    b) Realize4 bitfulladderusingstaticCMOsanddrawitsstickdiagram.

    15
    15

    schemeswithproperdiagrams"'".,,
    V. a) Explainoxideisolation

    OR
    b) Writeshortnoteson :
    I

    andtrenchisolation
    isolation
    i) Junction
    andconductance.
    resistance
    ii) Quantum

    Vous aimerez peut-être aussi