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Millmans Electronic Devices and Circuits J. Millman, C.C.Halkias, and Satyabrata Jit Tata
McGraw Hill, 2nd Ed., 2007.
2. Electronic Devices and Circuits R.L. Boylestad and Louis Nashelsky, Pearson/Prentice
Hall,9th Edition,2006.
3. Introduction to Electronic Devices and Circuits- Rober T. Paynter PE.
4.
1.
Electronic Devices and Circuits T.F. Bogart Jr., J.S.Beasley and G.Rico, Pearson Education,
6th edition, 2004.
2. Principles of Electronic Circuits S.G.Burns and P.R.Bond, Galgotia Publications, 2nd Edn..,
1998.
3. Microelectronics Millman and Grabel, Tata McGraw Hill, 1988.
4.
Electronic Devices and Circuits Dr. K. Lal Kishore, B.S.
Because of the displacement of these charges, electric field will appear across the
junction.
Since p-side looses holes, negative field exists near the junction towards left.
Since n-side looses electrons, positive electric field exists on the n side.
But at a particular stage the negative field on p-side becomes large enough to prevent
the flow of electrons from n-side.
Positive charge on n-side becomes large enough to prevent the movement of holes
from the p-side.
The charge distribution is as shown in Fig.1 ( b).
The charge density far away from the junction is zero, since before all the holes from
p-side move to n-side, the barrier potential is developed.
Acceptor atoms near the junction have lost the holes.
But for this they would have been electrically neutral.
Now these holes have combined with free electrons and disappeared leaving the
acceptor atom negative.
Donor atoms on n-side have lost free electrons.
These free electrons have combined with holes and disappeared.
So the region near the junction is depleted of mobile charges.
This is called depletion region, space charge region or transition region.
The thickness of this region will be of the order of few microns.
The electric field intensity near the junction is shown in Fig.1 ( c).
This curve is the integral of the density function .
Biasing
As the applied bias increases in magnitude the depletion region will continue
to decrease in width until a flood of electrons can pass through the junction,
resulting in an exponential rise in current
When p-type and n-type semiconductors are brought into intimate contact pn junction is formed.
Then the Fermi level must be constant throughout the specimen. If it is not so,
electrons on one side will have higher energy than on the other side.
So the transfer of energy from higher energy electrons to lower energy
electrons will take place till fermi level on both sides comes to the same level.
But we have already seen that in n-type semiconductors, EF is close to
conduction band Ecn and it is close to valence band edge Evp on p-side.
So the conduction band edge of n-type semiconductor cannot be at the same
level as that of
p-type semiconductor Hence, as shown, the energy
band diagram for a p-n junction is where a shift in energy levels Eo is
indicated.
EG
EF
Eo
Een
Ecp
Evn
Evp
= Energy gap in eV
= Fermi energy level
= Contact difference of potential
= Conduction Band energy level on the n-side.
= Conduction Band energy level on the p-side.
= Valence Band energy level on the n-side.
= Valence Band energy level on the p-side.
If a central line EG/2 is taken, the shift in energy levels is the difference between the two central lines E G/2
of the two semiconductors
This energy E0 represents the potential energy barrier for electrons. The contact difference of potential
When a forward bias is applied to the diode, holes are injected into the n-side and
electrons to the p-side.
The number of this injected carriers decreases exponentially with distance from the
junction.
Since the diffusion current of minority carriers is proportional to the number of
carriers, the minority carriers current decreases exponentially, with distance.
There are two minority currents, one due to electrons in the p-region Inp, and due to
holes in the n-region Ipn.
As these currents vary with distance, they are represented as Ipn(x).
Electrons crossing from n to p will constitute current in the same direction as holes
crossing from p to n. Therefore, the total current at the junction where x = 0 is I=
Ipn(O) + Inp(O)
The total current remains the same. The decrease in Ipn is compensated by increase in
Inp on the p-side.
In a forward biased p-n junction diode, at the edge of the diode on p-side, the current
is hole current (majority carriers are holes).
This current decreases at the junction as the junction approaches and at a point away
from the junction, on the n-side, hole current is practically zero.
LAW OF THE JUNCTION
(1)
where V 0 is the Electrostatics Barrier Potential that exists on both sides of the Junction. But
the thermal equilibrium hole concentration on the p-side where
Ppo = Pn (0) = e(Vo -V)/VT
.(2)
Therefore, the total hole concentration in 'n' region at the junction varies with applied forward
bias voltage V as given by the above expression.
This is called the Law of the Junction.
Similarly the electron current due to the diffusion of electrons from n-side to p-side is
obtained from the above equation itself, by interchanging n and p.
The total diode current is the sum of Ipn (0) and Inp(0)
In this analysis we have neglected charge generation and recombination. Only the
current that results as a result of the diffusion of the carriers owing to the applied
voltage is considered.
For Germanium, the current due to thermal generation of carriers and recombination
can be neglected. But for Silicon it cannot be neglected.
So the expression for current is modified as
A positive value of I means that current flows from the p to the n side. The diode is forwardbiased if V is positive, indicating that the p side of the junction is posigive with respect to the
n-side. The symbol is unity for geminium and approximately 2 for silicon at rated current
In the case of Silicon and Germanium, diodes there is a Cut In or knee voltage below which
the current is negligible. It's magnitude is 0.1V to 0.3V for Germanium and 0.3V0.7V for
Silicon
DIODE RESISTANCE
The static resistance (R) of a diode is defined as the ratio of of the diode. Static resistance
varies widely with V and I. The dynamic resistance or incremental resistance is defined as the
reciprocal of the slope of the Volt-Ampere Characteristic
Where |dQ| is the magnitude of charge increase due to voltage dV. It is to be noted that there is negative
charge on the p-side and positive charge on n-side. But we must consider only its magnitude.
Therefore, if the voltage dV is changing in time dt, then a current will result, given by
This current exists for A.C. only. For D.C. Voltage is not changing with time. For D.C. capacitance is open
circuit.
DIFFUSION CAPACITANCE, CD
This is a p-n junction device, in which zener breakdown mechanism dominates. Zener diode
is always used in Reverse Bias.
Its constructional features are:
1. Doping concentration is heavy on p and n regions of the diode, compared to normal
p-n junction diode.
2. Due to heavy doping, depletion region width is narrow.
3. Due to narrow depletion region width, electric field intensity E =V/D
When the Zener diode is reverse biased, the current flowing is only the reverse
saturation current 10 which is constant like in a reverse biased diode.
At V = Vz due to high electric field (V Z /W), Zener breakdown occurs. Covalent
bonds are broken and suddenly the number of free electrons increases.
So Iz increases sharply and V z remains constant, since, Iz increases through Zener
resistance Rz decreases.
So the product V z = Rz. Iz almost remains constant.
If the input voltage is decreasea, the Zener diode regains its original structure. (But if
Vi. is increased much beyond Vz electrical breakdown of the device will occur. The
device looses Its semiconducting properties and may become a short circuit or open
circuit. This is what is meant by device breakdown. )
Applications
1. In Voltage Regulator Circuits
2. In Clipping and Clamping Circuits
3. In Wave Shaping Circuits.
In an ordinary p-n junction diode the doping concentration of impurity atoms is 1 in 108.
With this doping, the depletion layer width, which constitutes barrier potential is 5 J.l V. If the
concentration of the impurity atoms is increased to say 1 in 1 03( This corresponds to
impurity density of ~ 1019 1m3), the characteristics of the diode will completely change.
Such a diode is called Tunnel Diode. This was found by Esaki in 1958.
TUNNELING PHENOMENON
Barrier Potential VB :
So, the width of the junction barrier varies inversely as the square root of impurity
concentration.
Therefore as NA increases W decreases. Therefore, in tunnel diodes, by increasing
NA, W can be reduced from 5. to 0.01.
According to classical mechanics, a particle must possess the potential which is at
least equal to, or greater than, the barrier potential, to move from one side to the other.
When the barrier width is so thin as 0.01 , according to Schrodinge equation, there is
much probability that an electron will penetrate when a forward bias is applied to the
diode, so that potential barrier decreases below E0 .
The n-side levels must shift upward with respect to those on the p-side.
So there are occupied states in the conduction band of the n material, which are at the
same energy level as allowed empty states in the valence band of the p-side.
Hence electrons will tunnel from the n-side to the p-side giving rise to forward
current.
As the forward bias is increased further, the number of electrons on n-side which
occupy the same energy level as that vacant energy state existing on p-side, also
increases.
So more number of electrons tunnel through the barrier to empty states on the left side
giving rise to peak current Ip.
If still more forward bias is applied, the energy level of the electrons on the n-side
increases, but the empty states existing on the p-side, reduces.
So the tunneling current decreases.
In addition to the Quantum Mechanical Tunneling Current, there is regular pnjunction injection current also.
The magnitude of this current is considerable only beyond a certain value of forward
bias voltage. Therefore, the current again starts beyond Vv
Ip = Peak current
Iv = Valley current
VF = Peak forward voltage
Vp = Peak voltage
(a)
Symbol
of
Tunnel
Diode
( b ) Equivalent Circuit
For small forward voltage (ie., Vp =50mV for Ge), forward resistance is small =
The series inductance Ls depends upon the lead length and the geometry of the diode
package. Ls =5 nH.
Barrier of transition capacitance CT varies with the value of reverse bias voltage. The larger
the reverse voltage, the larger the W.
RECTIFIERS
Rectifier converts sinusoidal signal to unidirectional flow and not pure D.C.
Rectifier is a circuit which offers low resistance to the current in one direction and
high resistance in the opposite direction.
Filter converts unidirectional flow into pure D.C.
If the input to the rectifier is a pure sinusoidal wave, the average value of such a wave
is zero, since the positive half cycle and negative half cycle are exactly equal.
AC input waveform
HALF WAVE RECTIFIER
VDC =
since
% regulation
The variation of D.C output voltage as a function of D.C load current is called 'regulation'.
RMS current
RIPPLE FACTOR
Efficiency =
In
the above circuits the diode is being subjected to a maximum voltage of V m. It occurs when the diode is
Ripple factor