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OUTLINE
Motivation Cantilever Beam Model Theory Simulation and Comparison Results Clamped-Clamped Beam Model Theory Simulation and Comparison Results
YALE UNIVERSITY Engineering & Applied Science
MOTIVATION
Devices that work under potential shock or high vibration, such as portable devices used in space and military applications, requires Enough immunity to environmental effects Actuate under a predetermined condition, such as electrostatic force or inertial force Accurate models to design them to suit specific needs without actually fabricating them.
MOTIVATION
Yao et.al.,
Zavracky et.al.,
CANTILEVER BEAM
Floating Electrode
Driving Electrode
Signal Electrode
CANTILEVER BEAM
V (0, t ) = 0 V t =0
( 0 ,t )
2V x 2 3V x 3
=
( L ,t )
=
( L ,t )
2V ( x, t ) V ( x, t ) 5V ( x, t ) 4V ( x, t ) A + EI =F + + I 2 4 4 t t x t x
F=
b
2( g z )
V 2 + C * A * a g 2
V ( x, t ) =
X ( x)T (t )
CANTILEVER
0 x 10
-7
T D ip isplacem (m ent )
-2
SIMULINK COMSOL
Pulls in at 1V
L = 275 m, b = 30 m, h = 1 m, d = 1 m, E = 169 GPa, = 0.22, (30g)
-4
-6
-8 0
0.01
0.02
0.03
0.04
time (sec)
d h
YALE UNIVERSITY Engineering & Applied Science
CANTILEVER
0 Tip D isplacem ent(m ) -0.2 -0.4 -0.6 -0.8 -1 0 x 10
-6
COMSOL SIMULINK
30g
1.5 -4 x 10
CANTILEVER
Tip D isplacem (m ent )
0 -2 -4
T D ip isplacem (m ent )
x 10
-7
0 x 10 -2 -4 -6 -8 0
-7
SIMULINK COMSOL
COMSOL SIMULINK
210g
-6 -8 0
190g
0.01 0.02
0.005
0.01
0.015
time (sec)
time (sec)
CLAMPED-CLAMPED
Floating Electrode
Driving Electrode
Signal Electrode
L = 400m, d = 3m, E = 77 GPa, = 0.33 b = 50m, h = 1m COMSOL Pamidighantam et al., [5] 17.8 V 18.58 V
YALE UNIVERSITY Engineering & Applied Science
CLAMPED-CLAMPED
Displacement in the middle (m) 0 -2 -4 -6 -8 0 1 2 time(sec) 3 x 10 4
-4
x 10
-7
CLAMPED-CLAMPED
A
+ EI
z ( x ,t) + t 2
4
f ( x ,t) +
bV 2 2 (d z )
CLAMPED-CLAMPED
Displacement in the middle (m) 0 x 10
-7
COMSOL1
-1
1V electrostatic force
-2
-3
-4 0
3 time(sec)
5 x 10
6
-4
CLAMPED-CLAMPED
Displacement in the middle (m) 0 x 10 -0.2 -0.4 -0.6 -0.8 -1 0
-6
COMSOL
3 time (sec)
5 x 10
6
-4
CLAMPED-CLAMPED
Displacement in the middle(m) 0 x 10
-7
COMSOL -2
x 10
-6
COMSOL
280g
-4
290g
-6
-8 0
0.2
0.8 x 10
1
-3
-1 0
0.2
0.4
0.6 time(sec)
0.8
1.2 -3 x 10
CLAMPED-CLAMPED
D la m n in th m d (m isp ce e t e id le )
0 x 10
-6
-0.5
2600g
-1
-1.5
-2 0
4 x 10
6
-4
time (sec)
CLAMPED-CLAMPED
0.5 x 10
-6
T D la m n (m ip isp ce e t )
2700g
time (sec)
CONCLUSION
It is possible to design microswitches that actuate under certain voltage but remains open with a little smaller voltages Microswitches can be immune to shock loading without pull-in under voltages close to the pull-in voltage Dynamics of the beams are mostly affected by the presence of the immediate plate, namely by the squeeze film damping. Immunity to shock loads can be further enhanced by deliberately introducing nonlinearity due to stretching.
YALE UNIVERSITY Engineering & Applied Science
ACKNOWLEDGEMENTS
Advisor: Prof. Hr Koer Colleague: Bozidar Marinkovic
REFERENCES
[1] P. M. Zavracky, S. Majumder and N. E. McGruer, "Micromechanical switches fabricated using nickel surface micromachining," Journal of Microelectromechanical Systems, vol. 6, pp. 39, 1997. [2] J. Yao and M. F. Chang, "Surface micromachined miniature switch for telecommunications applications with signal frequencies from DC up to 4 GHZ," in 1995, pp. 384-387. [3] Senturia S D, Microsystem Design, pp.135-137. Kluwer, Dordrecht (2001) [4] S. Chowdhury, M. Ahmadi and W. C. Miller, "Pull-in voltage calculations for MEMS sensors with cantilevered beams," in 2005, pp. 143-146. [5] S. Pamidighantam, R. Puers, K. Baert and H. A. C. Tilmans, "Pull-in voltage analysis of electrostatically actuated beam structures with fixed-fixed and fixed-free end conditions," J Micromech Microengineering, vol. 12, pp. 458-464, JUL. 2002. [6] R. Puers and D. Lapadatu, "Electrostatic forces and their effects on capacitive mechanical sensors," Sensors and Actuators, A: Physical, vol. 56, pp. 203-210, 1996. [7] M. Jia, X. Li, Z. Song, M. Bao, Y. Wang and H. Yang, "Micro-cantilever shockingacceleration switches with threshold adjusting and 'on'-state latching functions," Journal of Micromechanics and Microengineering, vol. 17, pp. 567-575, 2007. [8] M. I. Younis, R. Miles and D. Jordy, "Investigation of the response of microstructures under the combined effect of mechanical shock and electrostatic forces," Journal of Micromechanics and Microengineering, vol. 16, pp. 2463-2474, 2006.
REFERENCES
[9] S. M. Han, H. Benaroya and T. Wei, "Dynamics of transversely vibrating beams using four engineering theories," Journal of Sound and Vibration, vol. 225, pp. 935-988, 1999. [10] Inman J D, Engineering Vibration, pp.459-487. Prentice Hall, Upper Saddle River NJ(2001) [11] P. M. Osterberg, Electrostatically Actuated Microelectromechanical Test Structures for Material property Measurements, Ph.D. Dissertation, MIT, Cambridge, MA, 1995, pp. 5287. [12] H. Hosaka, K. Itao and S. Kuroda, "Damping characteristics of beam-shaped micro-oscillators," Sensors and Actuators, A: Physical, vol. 49, pp. 87-95, 1995. [13] P. D. Smith, C. R. Chatwin and R. C. D. Young, "Design, optimisation and predicted performance of a micro-machined IR sensor that exploits the squeeze film damping effect to measure cantilever beam displacement," Optics and Lasers in Engineering, vol. 45, pp. 503-522, 2007. [14] M. Bao and H. Yang, "Squeeze film air damping in MEMS," Sensors and Actuators, A: Physical, vol. 136, pp. 3-27, 2007. [15] M. Andrews, I. Harris and G. Turner, "Comparison of squeeze-film theory with measurements on a microstructure," Sensors and Actuators, A: Physical, vol. 36, pp. 79-87, 1993. [16] T. Veijola, H. Kuisma, J. Lahdenpera and T. Ryhanen, "Equivalent-circuit model of the squeezed gas film in a silicon accelerometer," Sensors and Actuators, A: Physical, vol. 48, pp. 239248, 1995. [17] M. I. Younis, F. Alsaleem and D. Jordy, "The response of clamped-clamped microbeams under mechanical shock," International Journal of Non-Linear Mechanics, vol. 42, pp. 643-657, 2007. [18] H.C.Kim and K.Chun, RF MEMS Technology,IEEJ Trans, vol.2,pp.249-261,2007
YALE UNIVERSITY Engineering & Applied Science