Presentation talk

Focused Ion Beam Thomas Gnthner u Generating a FIB FIBApplications

FOCUSED ION BEAM (FIB)

Thomas Gnthner u
TU Mnchen u

19th January 2009

Overview
Focused Ion Beam Thomas Gnthner u Generating a FIB FIBApplications

Generating a focused ion beam Ion sources Ion optics FIB-Applications Scanning ion microscopy (SIM) Focused ion beam lithography
Resistlithography Micromachining

Focused Ion Beam Thomas Gnthner u Generating a FIB

Ion sources Ion optics

FIBApplications

Generating a focused ion beam

Sample of a FIB-system
Focused Ion Beam Thomas Gnthner u Generating a FIB
Ion sources Ion optics

FIBApplications

Figure:

http://www.fzd.de/db/PicOri?pOid=24361, 01/17/2009

Ion sources
Focused Ion Beam Thomas Gnthner u Generating a FIB
Ion sources Ion optics

FIBApplications

Gas eld ion source (GFIS) Liquid metal ion source (LMIS) (Plasma ion gun)

Gas eld ion sources (GFIS)

Focused Ion Beam Thomas Gnthner u Generating a FIB
Ion sources Ion optics

FIBApplications

Figure:

http://www.smt.zeiss.com/nts, 01/17/2009

V Source tip needle-shaped E 1010 m

Imaging Gas ionized at tip as electron tunnels into the tip Ions accelerated to the extractor Virtual source size < possible A

Liquid metal ion sources (LMIS)

Focused Ion Beam Thomas Gnthner u Generating a FIB
Ion sources Ion optics

FIBApplications

Figure:

http://www.freepatentsonline.com, 01/17/2009

Atoms form a Taylor-Cone (end radius 101 nm very strong electric eld E ) Electric eld ionize atoms Virtual source size 50nm

Figure:

http://www.ehdtg.com/images, 01/17/2009

Liquid metal ion sources (LMIS)

Focused Ion Beam Thomas Gnthner u Generating a FIB
Ion sources Ion optics

FIBApplications

Figure:

http://www.freepatentsonline.com, 01/17/2009

Atoms form a Taylor-Cone (end radius 101 nm very strong electric eld E ) Electric eld ionize atoms Virtual source size 50nm

Figure:

http://www.ehdtg.com/images, 01/17/2009

Ion optics
Focused Ion Beam Thomas Gnthner u Generating a FIB
Ion sources Ion optics

Electrostatic lens system:

Condensor lens: parallelize, creates crossover in E B mass lter or aperture Objective lens: focus at sample

FIBApplications

Aperture: reduces ion beam current, spherical aberration, helps mass separating EB mass lter (Wien lter): separates ions after mass and charge if an alloy is used (only LMIS)

Further features
Focused Ion Beam Thomas Gnthner u Generating a FIB
Ion sources Ion optics

FIBApplications

Deector plates: Steering ion beam over sample with eletric elds in x- and y-direction (compare oscilloscope) Beam blanker: Deects ion beam so much that it will not penetrate the sample

Focused Ion Beam Thomas Gnthner u Generating a FIB FIBApplications

SIM FIB lithography Resistlithography Micromachining

FIB-Applications

Scanning ion microscopy (SIM)

Focused Ion Beam Thomas Gnthner u Generating a FIB FIBApplications
SIM FIB lithography Resistlithography Micromachining

SIM is very similar to SEM (see electron microscopy)

Figure:

http://www.crystaltexture.com/jpg 01/17/2009

Detected particles: low-energy secondary electrons (< 10eV ), secondary ions and photons

Properties of SIM
Focused Ion Beam Thomas Gnthner u Generating a FIB FIBApplications
SIM FIB lithography Resistlithography Micromachining

Ion mass electron mass Ion e almost no diraction if an ion beam is used
Figure:
http://www.smt.zeiss.com/nts, 01/17/2009

currently best resolution: 0.24nm Ion beam modies sample during observation (sputtered ions)

Properties of SIM
Focused Ion Beam Thomas Gnthner u Generating a FIB FIBApplications
SIM FIB lithography Resistlithography Micromachining

Ion mass electron mass Ion e almost no diraction if an ion beam is used
Figure:
http://www.smt.zeiss.com/nts, 01/17/2009

currently best resolution: 0.24nm Ion beam modies sample during observation (sputtered ions)

Properties of SIM
Focused Ion Beam Thomas Gnthner u Generating a FIB FIBApplications
SIM FIB lithography Resistlithography Micromachining

Secondary electrons much more sensitive to details of surface structure in the target than in SEM, sensitive to work function of surface Using ion-induced secondary ions and electrons to gain much information of the sample Chemical surface analysis by means of secondary ions
Figure:
http://bp1.blogger.com/rWWz5HvJNko/ RYVRwwxZ2I/AAAAAAAAABE,01/17/2009

Properties of SIM
Focused Ion Beam Thomas Gnthner u Generating a FIB FIBApplications
SIM FIB lithography Resistlithography Micromachining

Very strong contrast with ion-induced secondary electron images in case of crystalline targets

Figure:

http://www.crystaltexture.com/jpg, 01/17/2009

Focused ion beam lithography (FIBL)

Focused Ion Beam Thomas Gnthner u Generating a FIB FIBApplications
SIM FIB lithography Resistlithography Micromachining

FIBL includes: Resistlithography Micromachining

Resistlithography
Focused Ion Beam Thomas Gnthner u Generating a FIB FIBApplications
SIM FIB lithography Resistlithography Micromachining

Works similar as electron beam lithography

Figure:

http://www.techbriefs.com/images/stories/techbriefs/2007, 01/17/2009

Resistlithography
Focused Ion Beam Thomas Gnthner u Generating a FIB FIBApplications
SIM FIB lithography Resistlithography Micromachining

Thickness of resist adjusted to range of ion beam Avoid doping by using a two layer resist system No proximity eect (compare e-beam) Possible resolution: 20 30nm

Micromachining
Focused Ion Beam Thomas Gnthner u Generating a FIB FIBApplications
SIM FIB lithography Resistlithography Micromachining

Creating nanometer structures by sputtering material from a surface induce deposition on a surface

Applications: Failure analysis Lithographic mask repair Modication and repair of integrated circuits

Sputtering
Focused Ion Beam Thomas Gnthner u Generating a FIB FIBApplications
SIM FIB lithography Resistlithography Micromachining

Figure:

http://www.eaglabs.com/training/tutorials/sims-theory-tutorial, 01/17/2009

Sputtering
Focused Ion Beam Thomas Gnthner u Generating a FIB FIBApplications
SIM FIB lithography Resistlithography Micromachining

Figure:

Walter Schottky Institut, E24

Deposition
Focused Ion Beam Thomas Gnthner u Generating a FIB FIBApplications
SIM FIB lithography Resistlithography Micromachining

Figure:

http://cim.aamu.edu/Activities, 01/17/2009

Deposition induced by ion beam

Deposition
Focused Ion Beam Thomas Gnthner u Generating a FIB FIBApplications
SIM FIB lithography Resistlithography Micromachining

Figure:

Walter Schottky Institut, E24

Deposition
Focused Ion Beam Thomas Gnthner u Generating a FIB FIBApplications
SIM FIB lithography Resistlithography Micromachining

Literature
Focused Ion Beam Thomas Gnthner u Generating a FIB FIBApplications

J.Orlo, High-resolution focused ion beams, Rev. Sci.Instrum.64,1105(1993) M. Hillmann, 3-dimensionale Nanostrukturierung mittels fokussierter Ionenstrahllithographie, (2001) http://www.smt.zeiss.com http://www.freepatentsonline.com/6531811-0-large.jpg http://physics.pdx.edu/ esanchez/Research/ChargedBeam http://www.ehdtg.com/images http://www.fzd.de/db/PicOri?pOid=24361 http://bp1.blogger.com/rWWz5HvJNko/ http://www.crystaltexture.com/jpg http://www.techbriefs.com/images/stories/techbriefs/2007 http://cim.aamu.edu/Activities