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Introduction
Understanding the depth distribution of organic species is of great importance for the manufacture of a number of innovative devices such as organic electronics, medical devices and polymeric films.
Fluorinated materials
*
F F O HN F F OH Fmoc
Few analytical methods can measure these depth distributions to the required levels of accuracy and sensitivity, however in recent years it has become possible using cluster ion beam sputtering combined with X-ray photoelectron spectroscopy (XPS) and secondary ion mass spectrometry (SIMS).
O N O AI N N O N
A material that has higher XPS sensitivity than the nitrogen in Irganox 3114 was needed. FMOCpentafluoroL-phenylalanine N C24H16F5NO4 was selected and the fluorine signal used as the marker.
Irganox 1010
100 nm
100 nm
N N N N AI AI O O O O N N
O O
N N
N N
Alq3
(Tris(8-hydroxyquinolinato)aluminium) C27H18AlN3O3
NPB
(N,N-Di-[(1-naphthyl)-N,N-diphenyl] -1,1-biphenyl)-4,4-diamine) C44H32N2
Acknowledgements
Kratos Analytical Ltd for collaboration with the XPS depth profiling. Rasmus Havelund (NPL) for the SIMS image and data.
www.npl.co.uk