Microstripe Filter Optimization

EM Seminar - HP Momentum Paper 1
Moving from Analysis to Design Automation
Momentum
Optimization
Momentum Optimization
EM Seminar 1999
EM Optimization - Moving from Analysis to Design Automation
Objective
To illustrate circuit design flow
with HP ADS
To illustrate the use of
Momentum and Momentum
Optimization as part of the
design flow
EM Seminar 1999
page 2 of 36
This presentation will illustrate the design of a 3.2 GHz radial stub filter. The
microstrip filter focuses on the use of EM simulation as a verification tool.
Overview
Microstrip Radial Stub Filter
Analysis - Momentum
Design Refinement - Momentum Optimization
Design
Refinement
Model
Generation
Analysis
Momentum
EM Seminar 1999
page 3 of 36
This presentation will illustrate the design of a 3.2 GHz radial stub filter. The
microstrip filter focuses on the use of EM simulation as a verification tool.
Schematic-based
Design
D
E
S
I
G
N
Layout-based
Design
EM Simulation as an Analysis Tool
Design Flow
F
E
E
D
B
A
C
K
EM Seminar 1999
System Design
Synthesis
Post Processing
Circuit Design
Optimization
Layout
EM Simulation
EM Optimization
Manufacturing
page 4 of 36
This diagram illustrates a typical design flow. The design flow is broadly separated
into two parts: schematic-based design and layout-based design. Also represented is
the design feedback path which goes throughout the entire design process.
Schematic-based Design
The schematic-based design starts with system design, where specifications are set
and system architecture is studied to understand design tradeoffs. Once the system
architecture is set, the specifications of each sub-module is set.
After the system design and prior to circuit design, there is an initial investigation
into the design approach. This includes literature and textbook study, as well as the
use of specialized synthesis tools. The synthesis tools provide a starting point for
the circuit design.
Circuit Design involves the details of going from the design specification to the
final schematic-based design. This process involves the circuit simulators (linear
simulation, harmonic balance, transient, convolution, envelope,), as well as
design tools such as circuit optimization and post-processing of the analysis data.
Schematic-based Design
Project Manager says a filter is

needed to reduce the mixer LO
feed-through to the amplifiers.
Proposed Solution:
Design a MICROSTRIP radial stub
low pass filter
EM Seminar 1999
page 5 of 36
Some motivation starts the design process.

In this case, a filter is needed to reduce the mixer LO feed-through to the amplifiers
that follow.
The proposed solution is to design a microstrip radial stub low pass filter.
System Design
System Design
Synthesis
Low Pass Filter

1 dB corner freq = 3.2
GHz
> 25dB attenuation from
3.9-6.0 GHz
IF
LO
Circuit Design
RF
25 dB
Layout
EM Simulation
Manufacturing
EM Seminar 1999
page 6 of 36
From the system analysis, the low pass filter is determined to need a 1 dB corner
frequency at 3.2 GHz, with at least 25 dB of attenuation in the 3.9-6.0 GHz.
The system design portion of this project is done on the order of hours to days.
Synthesis
System Design
Synthesis
7th order Chebychev

fc = 3.2 GHz
passband ripple 0.5 dB
Circuit Design
Layout
EM Simulation
Manufacturing
EM Seminar 1999
page 7 of 36
Design Synthesis for the filter is done with E-Syn to determine the starting design.
It is determined that a 7th order Chebychev filter with fc = 3.2 GHz and passband
ripple of 0.5 dB will work. The ideal analysis gives slightly less than 25 dB of
rejection at 3.9 GHz, but the less desirable alternative was to go to a 9th order filter.
With the actual implementation in microstrip, the component values can be slightly
modified to achieve the goal.
The synthesis part of the design process can be done on the order of hours to days,
depending on the amount of research needed, and the ability of a standard design to
meet the design goals.
Circuit Design
System Design
Synthesis
Circuit Design
Layout
EM Simulation
Manufacturing
C1 = 1.728 pF
L1 = 3.129 nH
EM Seminar 1999
C3 = 2.624 pF
L3 = 3.343 nH
C4 = 2.624 pF
C2 = 1.728 pF
L2 = 3.129 nH
page 8 of 36
The ideal circuit is implemented in the schematic. This serves as a baseline

comparison for the electrical performance.
The goal for the circuit design process is to convert this ideal circuit into a physical
implementation using microstrip components.
Convert Ideal to Physical

Radial Stub 1 - C1,C2
Capacitance is 1.727pF
Method 1 - Iterative Analysis / Post Process
Microstrip Butterfly
Radial Stub
W = 40 mil
Ro = 218.7 mil
Angle = 60
D = 15 mil
Microstrip Butterfly
Radial Stub
W = 40 mil
Ro = 276.6 mil
Angle = 45
D = 15 mil
Substrate - GETEK
H = open Er = 1.0
H = 59 mil Er = 4.3
EM Seminar 1999
3.7 - 4.3 manufacturers

tolerance
page 9 of 36
The capacitors of the filter will be implemented as microstrip butterfly radial stubs.
The parameters for W and D are fixed, and through a manual process of binary
search, the angle and radius are determined. The capacitor value is determined
through post processing the S-parameters (illustrated on the next slide). The
dimensions determined for the radial stub are as follows:
C1= C2 = 1.727 pF { W = 40 mil, Ro = 218.7 mil, angle = 60, D = 15 mil }
C3 = C4 = 2.623 pF { W = 40 mil, Ro = 276.6 mil, angle = 45, D = 15 mil }
The substrate
The substrate used is 59 mil thick GETEK. Due to manufacturing tolerance, the
dielectric constant is held to a range between 3.7 and 4.3.
Understanding the manufacturing tolerance is important for design. A company, as
part of the design process, usually has characterized the material and the process
tolerance and can provide this information to designers to improve their design
accuracy.
At this point the circuit is being prototyped by an outside vendor. For this example
the material is considered to be an unknown; so the design is based on the
manufacturing specification for the material.
For the purpose of this presentation to illustrate the design process, the dielectric of
4.3 is chosen.
Convert Ideal to Physical Capacitance Calculation

Method 1 - Iterative Analysis / Post Process

EM Seminar 1999
page 10 of 36
The S-parameters from the analysis on the previous slide are converted into
capacitance. The S-parameter analysis is done at the 1 dB cutoff frequency 3.2 GHz.
Since microstrip is dispersive, the capacitor value determined here will appear to
have different values of capacitance at other frequencies. Since it is impossible
with microstrip to get the same capacitor values at all frequencies, the cutoff
frequency is chosen as the design frequency.
Since this is a one-port S-parameter analysis, S11 can be converted into Zin with the
equation:
Zin = 50*[(1 + S11) / (1 - S11)]
Zin can then be converted into an equivalent capacitance with the equation:
Cin = -1 / (2*pi*freq*imag(Zin))
10
Convert Ideal to Physical Capacitor

Method 2 - Circuit component optimization
The same values for the radial stub can be

found through Circuit Optimization
EM Seminar 1999
page 11 of 36
Circuit optimization can be used as an alternative to the binary search procedure

used in the previous slides. For this circuit, the radial stub (which is set up for
optimization) is connected to S-parameter Port 1, and the ideal capacitor is
connected to S-parameter Port 2. Two goals are set up to minimize the difference
between S11 and S22 for the real and imaginary terms.
Goals:
-0.001 < imag(S11) - imag(S22) < 0.001
-0.001 < real(S11) - real(S22) < 0.001
11
Convert Ideal to Physical Inductor

Inductor 1 - L1,L2
Microstrip
Transmission Line
W = 40 mil
L = 215 mil
Inductance is 3.129 nH
Inductor 2 - L3
Microstrip
Transmission Line
W = 40 mil
L = 225.7 mil
Inductance is 3.342 nH
EM Seminar 1999
page 12 of 36
In a similar way, a high impedance microstrip line is used for the inductor. Binary
search or optimization can be used to determine the dimensions. The dimensions
determined for the inductors are as follows:
L1= L3 = 3.129 nH { W = 40 mil, L = 215 mil }
L2 = 3.342 nH { W = 40 mil, L = 225.7 mil }
12
Schematic with Physical

Components
Replace ideal components with radial stubs and
inductive transmission lines
EM Seminar 1999
page 13 of 36
The major components of the circuit have been individually calculated and are now
assembled into the complete circuit. A 50 ohm microstrip transmission line and
taper have been added to each end of the filter, and the overall length is adjusted to
1.5 inches. An S-parameter simulation is done of the complete circuit.
13
Ideal vs. Physical Comparison
Ideal
Physical
Difference due to lumped versus distributed model
EM Seminar 1999
page 14 of 36
dB(S21) and dB(S11) are shown for the comparison. Each plot shows the ideal
circuit response (LC filter) and the microstrip circuit (physical) response. The
response at the 1 dB cutoff frequency is very close to the ideal. The response at 3.9
GHz achieves the < -25 dB specification. The obvious difference is in the stop band
loss detail above 3.9 GHz.
14
Layout
Synchronize layout from Schematic
System Design
Synthesis
Circuit Design
Layout
EM Simulation
Manufacturing
Substrate - GETEK
H = open Er = 1.0
H = 59 mil Er = 4.3
EM Seminar 1999
page 15 of 36
The design flow now crosses the design flow boundary between schematic-based
design and layout-based design. A layout of the schematic is produced. At this
point, there is design feedback to determine if the dimensions of the radial stubs and
transmission lines cause the geometry to overlap. It can also be observed if the
geometry would require EM simulation to determine the effect of parasitic
coupling.
15
EM Simulation
Layout
EM Simulation
HP Momentum
HP HFSS
HP Momentum - planar method of moments

HP HFSS - 3D finite elements
EM Seminar 1999
page 16 of 36
At this point, the designer determines that EM analysis is required. Two choices are
available: a planar EM solver or a 3D solver. HP offers Momentum as a planar
method of moments solver, and HFSS as a 3D finite elements solver.
HP Momentum is an integrated product which works directly from the Layout of
HP ADS. HP HFSS is a separate product which has translators to directly read
layout from HP ADS. If the layout is part of a solved Momentum project, then the
layout and substrate information are used to form a complete HP HFSS project. If
the layout is only in EGS format, then the translator provides the ability to define
the substrate definition and layer mapping.
16
EM Simulation - HP Momentum
System Design
Synthesis
Circuit Design
Layout
EM Simulation
Manufacturing
EM Seminar 1999
Mesh frequency 3.2 GHz

Edge mesh on
30 cells per wavelength
page 17 of 36
HP Momentum works directly from the layout of HP ADS. The mesh frequency is
set at 3.2 GHz. Edge mesh is enabled and the mesh is set to 30 cells per wavelength.
The results of the HP Momentum simulation are written out directly in the dataset
format of HP ADS, and viewed using the data display of HP ADS.
17
Translate to 3D EM Simulator
HP ADS
Add 3D features:
3D structures, e.g.
connectors, finite dielectrics,
housing features
metal thickness
HP ADS - HP HFSS
Translator
EM Seminar 1999
HP HFSS
page 18 of 36
Designs can be translated from HP ADS to HP HFSS. 3D features can be added to

the geometry, such as connectors, finite dielectrics, housing features, and metal
thickness. HP HFSS can write out data in CITIfile or Touchstone format, which
can be read back into HP ADS.
18
Circuit versus EM comparison
Differences due to
Added Parasitics in
Momentum
Momentum
Ideal
Physical
EM Seminar 1999
page 19 of 36
The results of the EM simulation can be compared to the ideal results and the
microstrip schematic simulation results. Momentum shows a large deviation in the
predicted stop band performance of the filter. This is due, mainly, to the additional
parasitics present in the actual geometry and not accounted for in the schematic
representation.
19
Manufacturing
Layout translator
(Gerber) used to link
to Manufacturing.
System Design
Synthesis
Circuit Design
Layout
EM Simulation
Manufacturing
EM Seminar 1999
page 20 of 36
Additional geometries needed for manufacturing are added to the layout. Layout
translators, such as Gerber, GDS-II, IGES, or DXF are available to link to
manufacturing. The completed prototype circuit is shown.
The prototype process time for this design was on the order of 3-4 weeks.
20
Schematic-based
Design
D
E
S
I
G
N
Layout-based
Design
Design Flow
F
E
E
D
B
A
C
K
System Design
Synthesis
Post Processing
Circuit Design
Optimization
Layout
EM Simulation
EM Optimization
Manufacturing
Learning
EM Seminar 1999
page 21 of 36
An important aspect of the design flow is the design feedback process. As tests and
prototypes are completed, it is important to incorporate the new learning into the
design. Feedback can affect all stages of the design flow, from the em simulation
up through system design.
21
Measured vs. Modeled Results
HP Momentum
Measured
Does not meet

specification
Need to account for the
differences
Ideal
EM Seminar 1999
page 22 of 36
The prototype is measured and compared to the Momentum simulation. In this

example, there is a significant difference in the filter response from the predicted.
22
Measured vs. Modeled

Resolution
Search for causes of discrepancy
Check manufacturing
Actual Geometry vs. Ideal Geometry
Actual Substrate vs. Ideal Substrate
Modify Design
EM Optimization
EM Seminar 1999
page 23 of 36
Since this is an unknown substrate and manufacturing process, there are several
possible causes for the differences in the simulation and measured results. It is
important to check the manufacturing process for the dimensions of the actual
geometry produced as well as the actual substrate properties. If both of these are in
agreement with the simulation assumptions, then the designer can look into
modifying the design.
23
Design Feedback - Geometry
Geometry is from 0.5 mil

to 1 mil over-etched in
different areas
EM Seminar 1999
page 24 of 36
The first design feedback is to check the geometry. Using a machinist microscope
to measure the circuit, it is observed that the etching process has over-etched the
circuit by varying amounts. The over-etched circuit is from 0.5 mil to 1 mil
different than the intended design. This can contribute to the difference in the
frequency response.
24
Design Feedback - Dielectric

Dielectric Measurement - HP 85070B Dielectric Probe
The measured dielectric
constant:
2.7 GHz - 3.75
3.2 GHz - 3.8
3.4 GHz - 3.85
Different from
er= 4.3 used in
simulation
EM Seminar 1999
page 25 of 36
Using the HP 85070B Dielectric Probe, a sample of the board was tested for
dielectric constant. The measured dielectric value was approximately 3.8, and not
4.3 that was used in the design assumption. The dielectric constant is also seen to
vary with frequency. In the range from 2.7 GHz to 3.4 GHz, the dielectric changes
by 0.1 .
25
Measured vs. New Modeled Results

Have determined the process
parameters
Have verified Momentums
ability to analyze performance
goal
HP Momentum
Need to change design to

meet specification
HP Momentum
Measured
Modified Geometry
HP HFSS
(thick metal)
EM Seminar 1999
Dielectric constant
= 3.8
page 26 of 36
The layout geometry is modified based on the microscope measurements, and the
new dielectric constant is used from the dielectric probe measurement. The
resulting Momentum analysis now compares favorably with the measured results.
This filter design does not meet the original design specification, but the learning
that resulted from the design feedback will help with the further design iterations.
The design process is a series of design and re-design steps that are used to gain an
understanding of the circuit and of the manufacturing considerations.
Simulation time:
Momentum - 4.5 min/freq 10 frequencies, total time 45 minutes (23 MB)
HP HFSS - 11 min/freq 6 frequencies, total time 70 minutes, thick metal (560 MB)
26
EM Optimization as a Design Tool
Overview
Microstrip Radial Stub Filter
Analysis - Momentum
Design Refinement - Momentum Optimization
Design
Refinement
Model
Generation
Analysis
Momentum
EM Seminar 1999
page 27 of 36
The existing design can now be used as a starting point for design refinement.
Momentum Optimization automates EM simulation and controls the geometric
parameters to improve the circuit performance toward the design goals. This filter
will be used to illustrate the Momentum Optimization process.
27
Define Parameters
Optimize L1 (L3 not shown)
Optimize L2
L1
L2
ind2
ind1
Optimize C3 (C4 not shown)
Optimize C1 (C2 not shown)
C3
C1
rad2
EM Seminar 1999
rad1
page 28 of 36
The parameters for this optimization are illustrated. Each graphic shows and
overlay of the nominal geometry with the perturbed geometry. Each of these
perturbed geometries exists in their own separate layout file. The four parameters
for optimization are:
The length of inductor L1 (L3 is changed at the same time as L1)
The length of inductor L2
The radius of the radial stub C1 (C2 is changed at the same time at C1)
The radius of the radial stub C3 (C4 is changed at the same time at C3)
The two rules to remember for defining an optimization parameter are:
There must be no change in the number of vertices.
The defined parameter represents a linear translation of the vertices
28
The Solution Process - Parameters
Parameter for Radius is defined:

Allow to vary during optimization
Lower and Upper Bound for parameter
Add makes a copy of the nominal design
EM Seminar 1999
page 29 of 36
The Momentum Optimization process is started from the Momentum menu. The
general process to start an optimization is the following:
Define candidate parameters for optimization
Specify the design goals
Setup and run the optimization
The parameters for this example are the radius of the radial stubs, and the length of
the inductive transmission lines. From the parameters dialog, define the following:
variable name
nominal value
perturbed value
starting value.
With the advanced options, the lower and upper limit can be set for the variable.
When Add is selected, a copy of the nominal design is automatically made to
define the perturbed design.
29
Momentum Optimization Geometry Capture

Define Nominal Design
Define a Perturbed Design
Move the affected vertices
on the Perturbed Design to
define the parameter for
optimization
EM Seminar 1999
page 30 of 36
Momentum Optimization uses a process called geometry capture to specify a

candidate parameter for optimization.
Geometry capture can be defined by the following process:
Define the nominal design - the geometry of interest will serve as a start
Define the perturbed design - simply define the parameter name to add, and
Momentum makes a copy of the nominal design in a new layout window.
Move the affected vertices on the perturbed design to define the parameter for
optimization. The difference between the nominal design and the perturbed design
will define the parameter.
30
The Solution Process - Specification
Specification goals for the

optimization:
frequency point or sweep
Goal and Weight
EM Seminar 1999
page 31 of 36
The next step in the Momentum Optimization process is to define the specification
goals. For this radial stub filter example, we need to express the two design goals
of interest:
dB(S21) at 3.2 GHz = -1dB
dB(S21) at 3.9 GHz = -25 dB
Other frequencies (or ranges of frequencies) as well as other inequalities could be
specified in the above goals were not sufficient to achieve the needed performance.
31
The Solution Process - Run
Optimization setup:
Optimization type
Interpolation type
Stopping criteria
EM Seminar 1999
page 32 of 36
The last step for Momentum Optimization is to define the type of optimization and
stopping criteria. Then select the start button.
Momentum Optimization starts the optimization process, and displays a window
that shows the error function result of each iteration.
32
The Solution Process - Results

optimal values displayed
increase rad1 by 17.51
increase rad2 by 4.26
increase ind1 by 5
increase ind2 by 5
EM Seminar 1999
Before and after

optimization
page 33 of 36
After the stopping criteria is met, the optimization parameter dialog is updated to
show the optimal value.
Select back annotate optimal values to make the starting values the same as the
optimal values. Then select view start design to open a layout window with the
geometry that represents the new starting values.
This process can be done for each geometry and each parameter of interest. EM
optimization could also be performed for the width of the high impedance
transmission lines (the inductors), or for the angle parameter of the radial stubs.
33
EM Analysis of entire structure

Goals:
1dB loss at 3.2 GHz
> 25 dB loss 3.9-6.0 GHz
Momentum
before opt
goal
Ideal
Momentum
after opt
EM Seminar 1999
page 34 of 36
The simulation of the optimal filter shows good agreement with the design goal.
34
Schematic-based
Design
D
E
S
I
G
N
Layout-based
Design
Design Flow - Time Optimization
F
E
E
D
B
A
C
K
EM Seminar 1999
~ 1-2 days
System Design
Synthesis
Circuit Design
Post Processing
Optimization
~ 1-2 hrs
Layout
EM Simulation
~ 1 day
EM Optimization
Manufacturing
~ 1-2 days
~ 2-4 weeks
page 35 of 36
EM optimization has been shown to be a vital part of the complete design flow.
35
Summary
Momentum
EM Analysis is a vital part of the design flow
Improve Time To Market
Integrated with HP Advanced Design System
With the addition of Momentum Optimization,
Momentum moves from being an analysis tool to a
design tool.
EM Seminar 1999
page 36 of 36
Summary
Momentum
- EM Analysis is a vital part of the design flow - Momentum simulation was used
for design verification, and served as the basis for uncovering the incorrect design
assumptions. Once the correct assumptions were used for the Momentum
simulation, there was good agreement between measured and modeled
performance.
- Improve Time to Market - Momentum, when used as part of the complete design
flow, can help reduce the number of design iterations and thus improve time to
market
- Integrated with HP Advanced Design System - Momentum was shown to be
integrated with the complete design environment, and so saves time and effort in
the design flow.
- moves Momentum from Analysis to Design Refinement - With the addition of
Momentum Optimization, Momentum is no longer simply an analysis tool: it is a
design tool.
- Automation improves time to market
- Integrated with Momentum
36

Microstripe Filter Optimization

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EM Seminar - HP Momentum Paper 1

Moving from Analysis to Design Automation

EM Optimization - Moving from Analysis to Design Automation

EM Optimization - Moving from Analysis to Design Automation

EM Optimization - Moving from Analysis to Design Automation

EM Optimization - Moving from Analysis to Design Automation

EM Simulation as an Analysis Tool

EM Optimization - Moving from Analysis to Design Automation

EM Simulation as an Analysis Tool

Project Manager says a filter is

Some motivation starts the design process.

EM Optimization - Moving from Analysis to Design Automation

EM Simulation as an Analysis Tool

Low Pass Filter

EM Optimization - Moving from Analysis to Design Automation

EM Simulation as an Analysis Tool

7th order Chebychev

EM Optimization - Moving from Analysis to Design Automation

EM Simulation as an Analysis Tool

The ideal circuit is implemented in the schematic. This serves as a baseline

EM Optimization - Moving from Analysis to Design Automation

EM Simulation as an Analysis Tool

Convert Ideal to Physical

Method 1 - Iterative Analysis / Post Process

3.7 - 4.3 manufacturers

EM Optimization - Moving from Analysis to Design Automation

EM Simulation as an Analysis Tool

Convert Ideal to Physical Capacitance Calculation

Radial Stub 2 - C3,C4

EM Optimization - Moving from Analysis to Design Automation

EM Simulation as an Analysis Tool

Convert Ideal to Physical Capacitor

The same values for the radial stub can be

Circuit optimization can be used as an alternative to the binary search procedure

EM Optimization - Moving from Analysis to Design Automation

EM Simulation as an Analysis Tool

Convert Ideal to Physical Inductor

EM Optimization - Moving from Analysis to Design Automation

EM Simulation as an Analysis Tool

Schematic with Physical

EM Optimization - Moving from Analysis to Design Automation

EM Simulation as an Analysis Tool

Ideal vs. Physical Comparison

Difference due to lumped versus distributed model

EM Optimization - Moving from Analysis to Design Automation

EM Simulation as an Analysis Tool

EM Optimization - Moving from Analysis to Design Automation

EM Simulation as an Analysis Tool

HP Momentum - planar method of moments

EM Optimization - Moving from Analysis to Design Automation

EM Simulation as an Analysis Tool

Mesh frequency 3.2 GHz

EM Optimization - Moving from Analysis to Design Automation

Designs can be translated from HP ADS to HP HFSS. 3D features can be added to

EM Optimization - Moving from Analysis to Design Automation

EM Simulation as an Analysis Tool

Circuit versus EM comparison

EM Optimization - Moving from Analysis to Design Automation

EM Simulation as an Analysis Tool

EM Optimization - Moving from Analysis to Design Automation

EM Simulation as an Analysis Tool

EM Optimization - Moving from Analysis to Design Automation

EM Simulation as an Analysis Tool