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18thOctober2014

LatchUpinCMOS

CMOSdeviceisoftenportrayedtobeanimpeccabledevice,especiallyinthe
textbooks.TherearesomeinnateproblemsintheCMOSdeviceandoneofthem
isthelatchup.We'regonnatalkaboutitindetail.
ConsiderthecrosssectionofaCMOSinverter.PleasenotethatIhaveskipped
drawingsomemetallayersandcontactsforthesakeofsimplicity.Myfocusison
explainingtheproblemoflatchupandnotthelayoutdesignrules!

[http://4.bp.blogspot.com/RiB4Vq_8SOE/VEGTw5vpIBI/AAAAAAAAD18/FTb
_SMJHWE/s1600/Fig1.png]
Figure1:CMOSwithparasiticBJTs

Intheabovecrosssection,notethat123formaparasiticpnptypebipolar
junctiontransistor,while432formaparasiticnpnbipolarjunctiontransistor.
SinceparasitictransistorswouldbepresentineveryCMOSdevice!Asimplistic
figuredepictingtheseparasitictransistorsisgivenbelow:

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[http://2.bp.blogspot.com/
akfXAV33bM0/VEGT4mbUwaI/AAAAAAAAD2E/AjEiNTbLKD4/s1600/Fig2.png]
Figure2:SimplisticFiguredepictingparasiticBJTs

Here,thenpnandthepnptransistorsaredepictedwith2and3beingcommon
betweenthetwotransistors.Alsonotethatthenwelllayerandthepsubstrate
atelightlydopedlayers,andhenceoffergreaterresistanceascomparedtothe
n+,p+drainandsourceregions.ThenwellresistanceofPMOSisdepictedby
theresistorR2andtheresistanceofpsubstrateisdepictedbytheresistorR1.
Let'ssay,we'vegotaspikeattheoutputoftheCMOSinverter.
1. Thisisanegativespike(orabump),whichdecreasesthepotentialofVOUT
belowgroundpotentialby0.7V.
2. Asaresult,thenpntransistor432getsturnedON,andtheemitter(n+,4)
startsemittingelectrons,whicheventuallygetcollectedatthecollector(n
well,2)andgointoVDD.
3. Thecurrenthenceflowsinthereversedirectionfromthen+bodytowards
thenwellregion.
4. Wewillhaveavoltagedropinthedirectionofcurrent,asaresultthe
potentialatthenwellcanreach0,7VbelowVDD.Thisturnsthepnp
transistorON,becausep+regionemitterisatVDD!
5. Thecurrentiscollectedatthecollector(psubstrate,3)andflowsintothe
groundthroughthep+bodyregion.
6. Goingoppositetothedirectionofcurrent,thepotentialdifferenceincreases,
andthevoltageatpsubstrate(justbelowthen+ofNMOS,mightreach0.7V,
therebyinjectingmorecurrent!

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[http://4.bp.blogspot.com/
uljDInmPbKI/VEGT_qfHbEI/AAAAAAAAD2M/XZJTLK3foVg/s1600/Fig3.png]
Figure3:Sequenceofeventsleadingtolatchup

Asevidentfromtheabovesteps,justonespikeattheoutputinitiatesachain
reactionresultingincurrentflowthroughthedeviceincessantly,andhencethe
devicegetswornoutinaveryshortspanoftime!Thisisthelatchup!
Howtomitigatetheproblem?
Well,aswejustnoticed,themaincauseoflatchupwastheresistanceofnwell
andthepsubstratelayers.Hence,themostlogicalsolutionwouldbetoincrease
theirdopingconcentrationbyionimplantation.Butthatwoulddeterioratethe
transistoroperation!Remember,weneedtokeepthedopingofwellsand
substratelowwhilethoseofsourceanddrainhighyoensureagoodtransistor
operation.
Whatdowedonow?
Well,weshallstickwithionimplantation,butinsteadofdoingitnearthesilicon
surfaceandhencenearthedrainandsource,implantadeepnwellwithhigh
dopingconcentration,andsimilarly,implantadeeppwellinsidethepsubstrate
toreducetheresistanceandhencekilltheparasticBJTaction!

References:
LatchupinCMOS,NPTELlecturesbyDr.NanditaDasgupta.

Posted18thOctober2014byNamanGupta
Labels:CMOS,LatchUp,LatchUpinCMOS,ParasiticBJTs
1 Viewcomments

HimanshuMangal October18,201410:50am
NiceArticle
Reply

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