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and heterogeneous reaction. These chemical issues are very often not simple even to
chemists. However, with the use of on-line monitoring and diagnostic tools (as
described in Section 10) together with the process modelling of the thermodynamics,
kinetics and mass transport of the CVD process, these have helped to unveil the
chemistry and uid dynamics in the CVD process and provide a better understanding of the chemical reactions and rate controlling steps. Moreover, the use of
single chemical precursor source has minimised the CVD process parameters that
needed to be controlled. The development and emergence of simpler and cost eective CVD-based techniques ESAVD and CCVD have also contributed to a wider
use of CVD in coating technology, and has opened up new application areas that
might have previously limited by the high cost/limitation of conventional CVD and
PVD.