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V ir tu o so Lay o ut Mi g r ate
POWER
PERFORMAN
CE
PARA
SI
TICS
Design Specification
Multi-Mode Simulation
Accelerated Layout
Silicon Analysis
Chip Finishing
PDKs
Customer IP
Mfg
Open Database
Constraint
Management
G0007A
A
ARE
Figure 1: All components of the Virtuoso platform work together to support fast, silicon-accurate
differentiated custom silicon
VIRTUOSO LAYOUT
MIGRATE
BENEFITS
Rapid layout migration through support
of all types of layout hierarchytypically resulting in an order-of-magnitude
7105_Figure 3
productivity improvement Cadence
over manual
efforts
Two-dimensional compaction that
produces high QoR as compared with
other solutions using one-dimensional
algorithms
Runtime = 10 min.
0.18 hm
Source
Layout
90nm
Pcell view
of Layout
Figure 2: Example of fast layout migration showing implicit handling of hierarchy and abutment
FEATUREs
FAST HIERARCHICAL AND TWODIMENSIONAL COMPACTION
w w w. c a d e n ce.com
DEF: 0.25 m
45 angles in gates
and routing
Migrate to 0.15 m
Single pass
Migrate to 0.15 m
Remove 45 angles
Optimize contacts
Figure 4: Example of fast layout migration showing the ability to handle complex design rules
Figure 5: Easy-to-use menu-driven setup and flow configuration systemthe fast track to productivity
SPECIFICATIONS
LAYOUT PROCESS AND
DESIGN RULE MIGRATION
Hierarchical two-dimensional optimization
Structure preservation including paths,
MPPs, symbolics, connectivity, and
properties
Pcell substitution to replace Pcells
or update their parameters during
migration
Menu-driven setup and flow configuration system
ECO support with Virtuoso Schematic
Editor and netlist-based device sizes
Figure 6: Technology files are easy to understand and writethis example shows how to implement a gate spacing rule
www.cadence.com
DESIGN INPUTS
Cadence CDBA database
DESIGN outputs
Cadence CDBA database
STREAM format
PLATFORM/OS
Sun/Solaris
HP-UX
Linux
THIRD-PARTY SUPPORT
SKILL-based tools and functions
Process design kits (please refer to the
PDK datasheets for more information)
SKILL
STREAM format