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Optik
journal homepage: www.elsevier.de/ijleo
Material Sciences Department, Faculty of Science, University of Biskra, Biskra 07000, Algeria
VTRS Laboratory, Institute of Technology, University of El-Oued, El-Oued 39000, Algeria
Mechanics Department, Faculty of Technology, University of Tbessa, Tbessa 12000, Algeria
a r t i c l e
i n f o
Article history:
Received 23 October 2013
Accepted 31 May 2014
Keywords:
ZnO
Thin lm
Semiconductor doping
Ultrasonic spray technique.
a b s t r a c t
Transparent conductive Co-doped ZnO thin lms were deposited by ultrasonic spray technique. Conditions of preparation have been optimized to get good quality. A set of cobalt (Co)-doped ZnO (between
0 and 3 wt%) thin lms were grown on glass substrate at 350 C. The thin lms were annealed at 500 C
for improvement of the physical properties. Nanocrystalline lms with hexagonal wurtzite structure and
a strong (0 0 2) preferred orientation were obtained. The maximum value of grain size G = 63.99 nm is
attained with undoped ZnO lm. The optical transmissions spectra showed that both the undoped and
doped ZnO lms have transparency within the visible wavelength region. The band gap energy decreased
after doping from 3.367 to 3.319 eV when Co concentration increased from 0 to 2 wt% with slight increase
of electrical conductivity of the lms from 7.71 to 8.33 ( cm)1 . The best estimated structure, optical
and electrical results are achieved in Co-doped ZnO lm with 2 wt%.
2014 Elsevier GmbH. All rights reserved.
1. Introduction
Wide band gap IIVI semiconductors have attracted the interest of many research groups during the past few years due to the
possibility of their applications in light-emitting diodes (LEDs) and
laser diodes. Among the IIVI semiconductors, ZnO is an important optoelectronic device material for use in the violet and blue
regions because of its wide band gap (3.37 eV) and large exciton
binding energy (60 meV) [1,2]. ZnO thin lms are promising candidates for applications in short-wavelength light-emitting devices,
lasers, eld emission devices, solar cells and sensors [3,4].
ZnO thin lms can be produced by several techniques such
as reactive evaporation, molecular beam epitaxy (MBE), magnetron sputtering technique, pulsed laser deposition (PLD), solgel
technique, chemical vapour deposition, electrochemical deposition
[57] and spray pyrolysis [8]. Among those techniques that have
been reported to prepare thin lms of ZnO, we will focus more particularly in this paper on the spray ultrasonic technique which is a
low cost and suitable method for large-scale production. It offers
several advantages in producing nanocrystalline thin lms, such as,
a simple deposition on glass substrate with a large range of temperatures, easy control of the lm thickness and ne and porous
microstructure with relatively homogeneous composition. Moreover, it is possible to alter the mechanical, electrical, optical and
magnetic properties of ZnO nanostructures with doping. There are
several reports on ZnO nanostructures doped with different elements, such as Al, Mn, Na, Mg, Ni, Ag [913].
The cobalt-doped ZnO thin lms (ZnO:Co) have various
applications such as transparent conductive; ferromagnetism;
semiconductors; piezoelectric and solar cells; the lms have low
resistivity, good optical gap energy at low temperature and good
transparency in the visible region [14]. Due to its high conductivity,
good transparency and lower cost, the lms are considered to be
an utmost important material.
In this paper, we have prepared Co-doped ZnO thin lms on
microscope glass substrate through ultrasonic spray technique. The
solution was sprayed on substrate at 350 C, and their thin lms
were annealed at a temperature of 500 C to improve their physical
properties. The effect of the Co concentrations on the ZnO lms has
been studied, in order to nd optimum Co doping concentration
which gives highly semiconducting properties of Co-doped ZnO
thin lms.
2. Experimental procedure
2.1. Preparation of spray solution
5865
Fig. 1. X-ray diffraction spectra of undoped ZnO lm and Co-doped ZnO lms at
different concentrations.
2.3. Characterization
Crystallographic and phase structures of the thin lms were
determined by X-ray diffraction (XRD, Bruker AXS-8D) with CuK
radiation ( = 0.1541 nm) at scanning range between 2 = 25 and
55 . The optical properties of the deposited lms were measured in
the range of 300800 nm using an ultravioletvisible spectrophotometer (UV, Lambda 35); whereas, the electrical conductivity of
the lms was measured in a coplanar structure obtained after evaporation of four golden stripes on the surface of deposited lms. All
spectra were measured at room temperature (RT) in air.
3. Results and discussion
Fig. 2. Variation of TC (1 0 0), TC (0 0 2), TC (1 0 1) and TC (1 0 2) with doping level in
ZnO:Co thin lms.
I(h k l)/I0 (h k l)
N 1
I(h k l)/I0 (h k l)
(1)
JCPDS data, N is the reection number and n is the number of diffraction peaks. The variations of TC(h k l) values for four major peaks of
the thin lms are presented in Fig. 2.
We can also observe that the texture coefcient of (0 0 2) peak is
the highest one conforming that all lms having preferential c-axis
orientation along the (0 0 2) plane as it was mentioned in the above
paragraph. The texture coefcient of (1 0 0), (1 0 1) and (1 0 2) planes
of the Co-doped ZnO thin lms for 1 and 3 wt% are approached near
zero. The enhanced crystalline quality of Co-doped ZnO thin lms
was obtained with 2 wt%. With the increase of Co concentration,
the intensity of (0 0 2) peak was increased, whereas the full widthat-half-maximum (FWHM) is decreased as it was shown in Table 1;
this remark is similar to the previously reported one in the litera-
Table 1
Bragg angle 2, the interplanar spacing d0 0 2 , the full width at half-maximum FWHM,
the crystallite size G, lattice parameters c and the residual stress for ZnO:Co thin
lms were measured as a function of doping level.
Doping level
(wt.%)
2 ( )
d (A)
FWHM ( )
G (nm)
c (nm)
(GPa)
0
1
2
3
34.54
34.49
34.54
34.55
2.59470
2.59834
2.59470
2.59397
0.13
0.28
0.14
0.26
63.99
29.61
59.42
31.88
5.18939
5.19668
5.18939
5.18793
1.436
0.805
1.436
1.562
5866
Fig. 3. The variation of crystallite size, the FWHM and the residual stress of undoped
and Co-doped ZnO thin lms with doping level.
Fig. 4. Transmission spectra of Co-doped ZnO thin lms as a function of cobalt
concentration Co/Zn: (a) 0, (b) 1, (c) 2 and (d) 3 wt%.
tures [19,20]. The average crystallite size of the lms from the XRD
was calculated using the Scherers equation [21]:
D=
0.9
.
cos
(2)
dh k l =
l2
4 h2 + hk + k2
+ 2
2
3
a
c
1/2
.
(3)
where a, c are the lattice parameters, (h, k, l) are the Miller indices
of the planes and dh k l is the interplanar spacing.
Additional information on structural properties can be obtained
from the residual stress measurements calculated by the following
formula [23].
= 450
c0 c
.
c
(4)
Fig. 5. The typical variation of (Ahv)2 vs. photon energy hv for undoped ZnO thin
lm. The inset shows the drawn of ln A as a function of photon energy (hv) for
deducing Urbach energy.
(5)
(Ah) = C(h Eg ),
(6)
where A is the absorbance, d is the lm thickness; T is the transmission spectra of thin lms; is the absorption coefcient values; C
is a constant, h is the photon energy and Eg the band gap energy
of the semiconductor. As it was shown in (Fig. 5) a typical variation of (Ah)2 as a function of photon energy (h) of undoped ZnO
thin lm, the optical band gap was determined by extrapolation
of the linear region to (Ah)2 = 0 [25]. Besides, we have used the
Urbach energy (Table 2), which is related to the disorder in the lm
network and expressed as [15]:
A = A0 exp
h
Eu
(7)
Table 2
The band gap energy Eg , the Urbach energy Eu and electrical conductivity for
ZnO:Co thin lms were measured as a function of doping level.
Doping level (wt%)
Eg (eV)
Eu (meV)
( cm)
0
1
2
3
3.367
3.278
3.319
3.295
085
267
040
166
7.71
7.19
8.33
7.86
5867
Fig. 6. The variation of optical band gap and Urbach energy of undoped and Codoped ZnO thin lms with doping level.
Fig. 7. Electrical conductivity of undoped and Co-doped ZnO thin lms as a function of cobalt concentrations.
5868
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