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Introduction
A Tunnel diode is an immediate application of the tunnel element. When a
thin insulator is sandwiched between two semiconductors we get a tunnel
diode. Tunnel diode can also be obtained, when the semiconductor is very
highly doped (the doping is greater than No) the Fermi level goes above the
conduction band for n-type and below valence band for p- type material.
The Resonant Tunnelling Diode (RTD) is a quantum well structure
semiconductor device that uses electron tunnelling and has the unique
property of negative differential resistance in its current-voltage
characteristics. For certain applied voltages, increasing the voltage leads to a
decrease in measured current. The IV characteristics of an RTD are shown in
figure below.
Studies
Tunneling diodes (TDs) have been widely studied for their importance in
achieving very high speed in wide-band devices and circuits that are beyond
conventional transistor technology. A particularly useful form of a tunneling
diode is the Resonant Tunneling Diode (RTD). RTDs have been shown to
achieve a maximum frequency of up to 2.2 THz as opposed to 215 GHz in
conventional Complementary Metal Oxide Semiconductor (CMOS) transistors.
The very high switching speeds provided by RTDs have allowed for a variety
of applications in wide-band secure communications systems and highresolution radar and imaging systems for low visibility environments.
Tunnelling
Quantum tunnelling or tunneling refers to the quantum mechanical
phenomenon where a particle tunnels through a barrier that it classically
could not surmount. Tunnelling is often explained using the Heisenberg
uncertainty principle and the waveparticle duality of matter. Pure quantum
mechanical concepts are central to the phenomenon, so quantum tunnelling
is one of the novel implications of quantum mechanics.It has important
applications to modern devices such as the tunnel diode, quantum
computing, and the scanning tunnelling microscope.
Construction
A tunneling element consists of two conducting materials separated by a
very thin insulator as shown in figure. Similarly electron confined to an atom
or molecule and electron bound to a quantum dot also represents a tunnel
element.
Figure 2: Schematic views of tunneling elements with (a) vertical & (b)
horizontal oriented
barriers
By means of band gap engineering one can fine tune the current voltage
characteristics of the tunneling element in such a way that it has a region
with negative differential resistance. Tunnel diodes and Resonant tunnel
diodes are the most common tunnel elements.
Operation
Tunneling diodes provide the same functionality as a CMOS transistor where
under a specific external bias voltage range,the device will conduct a current
thereby switching the device
on. However, instead of the current going through a channel between the
drain and source as in CMOS transistors, the current goes through the
depletion region by tunneling in normal tunneling diodes and through quasibound states within a double barrier structure in RTDs.
A TD consists of a p-n junction in which both the n- and pregions are
degenerately doped (>1019 cm-3). There is a high concentration of electrons
in the conduction band (EC) of the
n-type material and empty states in the valence band (EV) ofthe p-type
material. Initially, the Fermi level (EF) is constant because the diode is in
thermal equilibrium with no external
bias voltage. When the forward bias voltage starts to increase, the EF will
start to decrease in the p-type material and increase in the n-type material.
Since the depletion region is very narrow (<10nm), electrons can easily
tunnel through, creating a forward current as shown in Figure 1. Depending
on how many electrons in the n-region are energetically aligned to the empty
states in the valence band of the p-region, the current will either increase or
The I-V characteristics of the tunnel diode are interesting too as it consists of
a Negative differential resistance (NDR).
The important parameters of the I-V characteristics are
the peak current (Ip),
valley current (Iv),
peak voltage (Vp)
valley voltage (Vv) which can be derived from the diagram. The ratio of
Ipto Iv determines the signal amplitudes.
Applications of RTDs
RTDs have attracted a lot of attention and have been researched for almost
two decades because of their compatibility with many conventional
technologies such as high electron mobility transistors (HEMTs) and metal
oxide field effect transistors (MOSFETs). The high-speed, low power benefits
can now be applied to digital circuit applications.
diodes and the series RTD. The logic output is the voltage level stored by the
latch, which is clocked using a two-phase overlapping clock between
adjacent pipelined gates.
CONCLUSIONS
RTDs have allowed us to realize certain applications that will be beyond the
capability of CMOS technology. These low-power, high speed, and small
devices are especially important as we continue to scale down to the size of
atoms where heat and parasitic effects are a major problem. However, in
order for RTDs to reach its full potential, more mature fabrication techniques
are needed. Precise barrier thickness control is needed to insure uniformity
across the whole wafer. Also, the output power of RTDs is limited. More
research is needed to help realize RTD circuits without an amplifier or other
drivers. This will minimize the power and
area of the integrated circuit (IC).Current applications of RTDs with advanced
conventional
transistors have shown that RTDs is very promising for future ultrahigh-speed
digital devices.