What is optical lithography?

The optical system

Production process

Future and limits of optical lithography

References

Optical lithography
Robin Nagel
TUM

12. Januar 2009

Robin Nagel (TUM)

Optical lithography

12. Januar 2009

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What is optical lithography?

The optical system

Production process

What is optical lithography?

The optical system

Production process

Future and limits of optical lithography

References

Robin Nagel (TUM)

Optical lithography

Future and limits of optical lithography

12. Januar 2009

References

2 / 22

What is optical lithography?

The optical system

Production process

Future and limits of optical lithography

References

What is optical lithography?

Lithography (from the Greek - lithos: stone + grapho: to write)

optical lithography is a process used to selectively remove parts

of a thin film.
Until now, it is the only way for industrial mass production of
computer chips

Robin Nagel (TUM)

Optical lithography

12. Januar 2009

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What is optical lithography?

The optical system

Production process

Future and limits of optical lithography

References

The optical system

Robin Nagel (TUM)

Optical lithography

12. Januar 2009

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What is optical lithography?

The optical system

Production process

Future and limits of optical lithography

References

Mask making process

Exposure

Develop

Etch

Robin Nagel (TUM)

Optical lithography

12. Januar 2009

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What is optical lithography?

The optical system

Production process

Future and limits of optical lithography

References

Photoresist

The photoresist (DiazoNaphtoQuinon-(DNQ)Sulfonat) reacts under

the influence of the light to an Inden-carboxylic acid
The carboxylic acid has in orders of magnitude a higher solubility
The bonding of the SO2 R group defines the absorbed wavelength

Robin Nagel (TUM)

Optical lithography

12. Januar 2009

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What is optical lithography?

The optical system

Production process

Future and limits of optical lithography

References

Defects
Particles in the photoresist (dust,old photoresist)

Bubbles
Rough substrate

Tear-off

Robin Nagel (TUM)

Optical lithography

12. Januar 2009

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What is optical lithography?

The optical system

Production process

Future and limits of optical lithography

References

Kinds of photoresist

Robin Nagel (TUM)

Optical lithography

12. Januar 2009

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What is optical lithography?

The optical system

Production process

Future and limits of optical lithography

References

Oxidation and exposure

Lightsources can be:
Mercury lamps with a
wavelength of 365nm
state-of-the-art light sources
are Argon Fluoride (ArF)
Excimer lasers with a
wavelength of 193nm

Robin Nagel (TUM)

Optical lithography

12. Januar 2009

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What is optical lithography?

The optical system

Production process

Future and limits of optical lithography

References

Etch process

Robin Nagel (TUM)

Optical lithography

12. Januar 2009

10 / 22

What is optical lithography?

The optical system

Production process

Future and limits of optical lithography

References

Diffusion and implant

Robin Nagel (TUM)

Optical lithography

12. Januar 2009

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What is optical lithography?

The optical system

Production process

Future and limits of optical lithography

References

Deposition

Robin Nagel (TUM)

Optical lithography

12. Januar 2009

12 / 22

What is optical lithography?

The optical system

Production process

Future and limits of optical lithography

References

Oxidation

Robin Nagel (TUM)

Optical lithography

12. Januar 2009

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What is optical lithography?

The optical system

Production process

Future and limits of optical lithography

References

Interconnects

Robin Nagel (TUM)

Optical lithography

12. Januar 2009

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What is optical lithography?

The optical system

Production process

Future and limits of optical lithography

References

Metallization

Robin Nagel (TUM)

Optical lithography

12. Januar 2009

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What is optical lithography?

The optical system

Production process

Future and limits of optical lithography

References

Chemical mechanical planarization

Robin Nagel (TUM)

Optical lithography

12. Januar 2009

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What is optical lithography?

The optical system

Production process

Future and limits of optical lithography

References

Interconnects and layers

Robin Nagel (TUM)

Optical lithography

12. Januar 2009

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What is optical lithography?

The optical system

Production process

Future and limits of optical lithography

References

Future and limits of optical lithography

Rayleigh equation:
- k= resolution factor
k
- = wavelengh
W =
NA
- NA= Numerical aperture
For example: =193nm, NA=0.93 and k=0.25
0.25 193nm
= 52nm
0.93
Use of Extrem UV lights (13nm) or X-Ray (0.5nm)
W =

Use of new materials and techniques (such as immersion lithography)

Robin Nagel (TUM)

Optical lithography

12. Januar 2009

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What is optical lithography?

Robin Nagel (TUM)

The optical system

Production process

Optical lithography

Future and limits of optical lithography

12. Januar 2009

References

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What is optical lithography?

Robin Nagel (TUM)

The optical system

Production process

Optical lithography

Future and limits of optical lithography

12. Januar 2009

References

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What is optical lithography?

Robin Nagel (TUM)

The optical system

Production process

Optical lithography

Future and limits of optical lithography

12. Januar 2009

References

21 / 22

What is optical lithography?

The optical system

Production process

Future and limits of optical lithography

References

References
1
2
3
4

5
6

lecture nanoelectronics by Prof. Lugli at the Tum

Intel, The High-k Solution, 2007

Paolo A. Gargini, Silicon nanoelectronics and beyond,2004

Gordon E. Moore, Cramming more components onto integrated

circuits, 1965
Reed Business Information, 32 nm Marked by Litho, 2008
Daniel Bratton, Da Yang, Junyan Dai and Christopher K.
Ober,Recent progress in high resolution lithography,2006
Yong Chen, Anne Pepin, Nanofabrication:Conventional and

nonconventional methods,2001
icknowledge, Technology backgrounder: Immersion Lithography,

2003
Microchemicals, Lithografie, 2007

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