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Wang Resin
OH
O
OH
HO
Cl
Merrifield
resin
3 equiv NaOMe
DMAC, 50 C, 8 h
98%
OH
(1)
O
Wang (or HMP) resin
RCO2H
DIC, DMAP
DMF
O
O
(2)
OH
O
Cl
O
P
2. NaHCO3, Et3N
O
P
O
H
O
(3)
WANG RESIN
O
HO N
O
PPh3, DEAD
3 equiv each
OH
O
THF
O
(4)
O
O
NH2
RNuH
N
H
O
O
O
O
Nu
R
(5)
1. 4 equiv PhCHO
5% TFA, CH2Cl2, 24 h
2. 95% TFA cleavage
85% mass recovery
90% HPLC purity
(7)
HO
HN
N
H
O
N
NO2 , N
X=O
,O N
, S
O
O
HO
NH
N
H
PPh3Br2 or
NBS, Me2S
CCl3CN
DBU
NH
Br
O
O
O
CCl3 (6)
(8)
WANG RESIN
TFA
H
X
R
O
+
RXH
(9)
O
N
O
O
Bu4NOH
R2
THF, MeOH
R1
O
R3
N R2 (10)
the resulting cyclization serves to cleave the product off the resin.
Such protocols are not unique to the Wang resin and fall beyond
the scope of this article. An illustrative example32 (eq 10) features
a Claisen-like condensation to yield tetramic acids.
Related Reagents. HMBA Resin; Merrifield Resin; Rink
Resin.
HO
R1
A. Ganesan
University of Southampton, Southampton, UK