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2.2.

1 Mask Designing Using CAD Software

For the mask design in this semiconductor fabrication, the Turbo CAD designer
15.0 software were used to design pattern on the mask. In this experiment the
Turbo CAD were used to design 4 different mask which is:

Mask 1 Source and drain mask


Mask 2 Gate mask
Mask 3 Contact mask
Mask 4 Metal contact mask

Steps in designing mask

1. Open the Turbo CAD Designer 15.0 software from the desktop menu, select
on the file at the menu tab. Then the new TurboCAD drawing dialog box will
pop up. Click on New from Scratch and the process of designing can be
proceed.

Figure 2.1 Selecting New from Scratch in dialog box


2. Go to the options and select display.

3. Thus, the drawing setup box will appear. Go to space units to in order to
set default unit used whether it is in mm, cm or inch. Also make sure the
distance between grid is 0.5 cm for X and Y axis in the grid section.

4. Create layers between the mask by selecting the layers section in the
drawing setup box. In the layer section create 8 layers in order to separate
the design layer. The 8 layer that we have done are Circle, Alignment
mark, Source and Drain mask, Gate Oxide mask, Contact mask, Metal
mask and circle 9.5 which used as the indicator for drawing.
5. After setting all the requirements, then can be proceed to design the wafer
mask. To make a design at any shape, move cursor on the toolbar and
select any desire shapes or lines.

6. At first, make a square of 14.5 cm x 14.5 cm in order to create mask frame


in layer 0.

7. Then proceed on drawing a circle of 10 cm in layer 1 which the wafer used


is 10 cm for this semiconductor fabrication. Then proceed on design the
alignment mark in the layer 2 for the indicator where the direction of the
silicon wafer.

8. Then, the process of designing source and drain can be proceed in the
layer 3. There are 10 devices has been design for this wafer. Each devices
have 5 type of difference sizes which are:
Device A = 1 cm x 1 cm
Device B = 0.5 cm x 0.5 cm
Device C = 0.6 cm x 0.6 cm
Device D = 0.7 cm x 0.7 cm
Device E = 0.8 cm x 0.8 cm

To make a mask, select pickpoint hatch in the hatch toolbar. Click on the
desired region that want to be hatch. The hatch tools, will make a region
selected become dark and mask process has been done. This method
could be apply to any mask want to be design.
9. Then the gate oxide has been drawn in layer 4 with 5 different sizes of
devices use same as drawing in source and drain. The square was drawn in
the middle between of source and drain with the gap 0.5 cm.

10. Then proceed to the contact mask which is same as source and drain mask
in layer 6. The metal contact mask also has been drawn in the layer 7 with
the same 10 devices used with the 5 different size as before.

Mask 3: Contact mask

Mask 4: Metal contact mask

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