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Glancing Angle Deposition

Dhruv Pratap Singh
(2008PHZ8058)

Under the supervision of

Dr. J. P. Singh
Department of Physics
Indian Institute of Technology Delhi, New Delhi, India-110016
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Glancing Angle Deposition (GLAD)

 It is is a physical vapor deposition process where the
deposition flux is incident onto a substrate making a large angle
(θ) with respect to the surface normal and the substrate is
rotating in its azimuthal plane.

Substrate
normal
substrate

Φ rotation in θ
azimuthal plane
θ tilt in polar
plane
flux

Vapor source
Schematic of GLAD
Schematic of columnar growth in oblique angle deposition

Flux θ β
θ

Surface roughness

Initial nucleation forms shadowing centers Columnar structures formed due to the
shadowing effect
(Brett M J et al , IEEE Transactions on Nanotechnology 2005, 4, 269)

 Interplay of surface diffusion and shadow effect occurs during columnar

growth.
For θ = 65°

 The empirical relation

Vapor flux
between vapor incidence (θ)
angle and column tilt (β)angle is
tanβ= ½ tanθ.
1µm
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Shadow region increases with
increase in incidence angle (θ)
which results in increase in
inter columnar separation and
hence the porosity of film
200nm
Increase in columnar growth with angle
θ (Zhao et al, Proceedings of SPIE 2003, 5219, 59 ).

600nm
4
Slanted silver nanorods for θ = 87° (Dhruv P Singh et al, IIT Delhi)
 Production of periodically structured thin film :
 By growing artificial seeds (nucleation centers) we can grow the
columnar structures of desired distribution and periodicity.

Vapor flux Substrate

normal

θ seeds

Substrate
(Brett M J et al , IEEE Transactions on Nanotechnology 2005, 4, 269)

Growth of Si slanted
posts over patterned
substrate
1 µm
(Ye et al, Nanotechnology 15, 2004, 817 ).5
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Effect of substrate rotation on columnar

structures

 Chevrons (zig-zag structures).

 Vertical Post.

 Helices (nanospring).

 Multilayered columnar structures.

Chevrons

substrate
Columnar Normal to
structure 180° rotation in substrate
azimuth plane

Zig-zag
Vapor (chevrons)
flux columns

Vapor source

Chevrons (Brett M J et al , IEEE Transactions on Nanotechnology 2005, 4, 269) 7

Vertical posts

Rotation in
Vapor flux (F)
Substrate
Substrate F‫׀׀‬ azimuth plane
normal
rotation
θ
F θ
F
Substrate
Substrate

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Vertical posts (Zhao et al, Proceedings of SPIE 2003, 5219, 59 ).
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Nanosprings

Slow One
rotation Pitch

 Substrate is rotated at very slow speed ( 0.07 to 0.20 rpm).

 Rotation is decided by deposition rate,

One pitch of helical column must grow in one substrate

rotation.

Helices (Zhao et al, Proceedings of SPIE 2003, 5219, 59 ).

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Multilayered nanostructures

 By programming the stepping motor for different rotation speed

multilayered structures can be grown .

(Zhao et al, Proceedings of SPIE 2003, 5219, 59 ).

Reported growth parameters for different
nanostructures
Nano- Deposition Oblique Substrate Material – Reference
structures rate Angle Rotation Substrate
(Å/sec) ( rpm )
4.0 86° 0.5 ZnO - Soda Abraham Wolcott,
lime glass Advanced functional
Vertical mat. 2009, 19, 1849.
post 15 86° 0.22 Co – Si M. J. Brett, J. Vac. Sci.
Technol. 1999, 17, 2671.
20 75° 0.64 Fe –Si(100) F. Liu, J. Appl. Phys.
1999, 85, 5486
3.0 87° 0.07 Si–SiO2 Ambarish Ghosh, Nano
letter 2009, 9, 2243
15.5 86° 0.12 Ti – Si M. J. Brett, J. Vac. Sci.
Helices Technol. 1999, 17, 2671.
20 75° 0.16 Fe –Si(100) F. Liu, J. Appl. Phys.
1999, 85, 5486
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My deposition chamber (GLAD)

QCM and Electric feed

through ( on rear side)

Turbo molecular
pump
View port

Pirani gauge
Water cooled
feed through
LT power
supply
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