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DATE:
L-EDIT
L-edit is an integrated circuit physical design tool from Tanner EDA. This tool allows to draw
the layout of an IC, look at cross-sections, perform DRC and LVS. There are some design kits
that come with L-edit including the AMI/On-Semiconductor 0.8um kit, which we will use in
this document.
PROCEDURE:
Step 1:
1. Launch L-edit, Start a design, and Setup the Technology
a. -launch L-edit using: Start – All Programs – Tanner EDA – Tanner Tools v12.6 –
L-Edit v12.6
2. Create a new layout design:
a. File – New
b. select “Layout”
c. under “Copy TDB…”, select <empty> from the bottom dialog
d. Click “OK”
3. Load in the mamin08 design kit:
- File – Replace Setup Browse to:
…\Documents\Tanner EDA\Tanner Tools v12.6\L-Edit and LVS\Tech\Mosis
-select the “mamin08.tbd” file (this stands for Mosis/AMI N-well 0.8um)
- Click “OK”, and “OK” again.
Notice that all of the layers available in the 0.8um AMI design kit are now in the drawing
palette on the left.
4. Verify the technology rule options:
- Setup – Design
You should see the design setup options. If everything worked, you should see the following.
Notice that Lambda is equal to 0.5um. This is important because the design rules for DRC
are specified in terms of lambda.
4) Run DRC to make sure the dimensions are not violating any design rules
- Click on the DRC button in the upper left corner of the screen (little green play
arrow).
Finally the DRC should be run:
5) View the Cross Section of the layout:
- Tools – Cross-Section - we need to specify an *.xst file (if not already loaded).
This can be found in the same directory as the original *.tbd file.
The file is called “mamin08.XST”. Browse and select:
…\Documents\Tanner EDA\Tanner Tools v12.6\L-Edit and
LVS\Tech\Mosis\mamin08.xst
- In the dialog that comes up, we can specify the cross-section point using the
up/down arrows or by selecting “pick” - Under “Exaggeration”, check the box that says
“center to window”
- Click “OK”, the FOX that exists everywhere except in the active region and the thin
oxide under the poly can be seen.
6) Enter the Body Diffusion point for the NMOS - In order to enter a body contact, we need
to tell the tool that we are going to create a p+ diffusion region. We do this using the active
and P-select layers. Put a substrate diffusion region next to the NMOS as follows:
7) Enter the contact windows for the NMOS - we do this using the Active Contact layer
8) Enter Metal 1 to connect the Source and Body of the NMOS together and put a little
Metal1 over the Drain contact to connect to later.
LAYOUT FOR PMOS
A PMOS device is made in a similar manner as the NMOS except that we need to specify the
N-well and use P-select instead of N-select.
1) Enter the PMOS N-well, P-select, Active, Poly, Active Contact, and Metal 1 as follows:
Connecting the Inverter
Metal and Poly are connected together by simply drawing \rectangles that are adjacent to
or overlap another rectangle of the same type (i.e., M1 to M1, Poly to Poly). Connect the
inverter together as shown in the following figure:
- We typically put horizontal strips across the chip to route VDD and VSS to multiple
devices. These are called power supply “rails”.
- Connect the gates together using Poly and then route the signal up to Metal 1 using
a Poly Contact - Connect the drains together using Metal 1
- Label the 4-nodes of the inverter using the Drawing Ports button. (VDD, VSS, VIN,
VOUT)
VDD
PMOS
In Out
NMOS
RESULT:
Thus the INVERTER layout was drawn using l-edit and layout parameters are
extracted.
EX NO:
DATE:
7. Now extract the circuit parameters from L-Edit to T-Spice using mamin08.xst file and
extracted parameters are as show below in the figure.
RESULT:
Thus the NAND GATE layout was drawn using l-edit and layout parameters are
extracted.
EX NO:
DATE:
3. Now extract the circuit parameters from L-Edit to T-Spice using mamin08.xst file and
extracted parameters are as show below in the figure.
RESULT:
Thus the NOR GATE layout was drawn using l-edit and layout parameters are
extracted.