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band model for GeTe and SnTe, assuming that the ACKNOWLEDGMENTS
most significant couplings between bands are a trans-
We are grateful to P. J. Stiles for his many helpful
verse momentum coupling between the principal
valence and conduction bands and a longitudinal cou- suggestions, D. O'Kane for supplying us the single-
pling between the principal conduction and the second crystal GeTe and SnTe, J. Angilello for the x-ray work. ,
valence bands, we are able to explain most of the and T. Hajos and J. Cummings for part of the optical
available experimental results for GeTe and SnTe. and galvanomagnetic measurements.
The optical constants of VO2 have been determined between 0.25 and 5 eV both below and above the
semiconductor-metal transition temperature T&= 340 K. ReQectivity and transmission spectra have
been measured on both single crystals and thin films. The reQectivity spectra of the bulk crystals were
measured with EJ (c axis) in the tetragonal phase [or J (a axis) in the monoclinic phasej, and with
E parallel to these axes. While there are some differences in magnitude between the dielectric constants
obtained from thin-film and single-crystal measurements, the structural features are in good agreement.
Below Tg there are four prominent absorption peaks centered near photon energies of 0.85, 1.3, 2.8, and
3.6 eV. Above Tg, metallic free-carrier absorption is observed below 2.0 eV, but the same two absorption
peaks near 3 and 4 eV are present. The energy location and polarization dependence of these two higher
energy peaks can be related to similar absorption peaks in rutile, and are interpreted using the rutile band
structure. The results are consistent with a picture in which filled bands arising primarily from oxygen 2p
orbitals are separated by approximately 2.5 eV from partially filled bands arising primarily from vanadium
3d orbitals. Transitions from the filled 2p bands are responsible for the high-energy peaks in the optical
absorption in both the high- and low-temperature phases. In the high-temperature metallic phase, there is
evidence that there is overlap among the 3d bands such that at least two bands are partially occupied by the
extra d electron per vanadium ion. In the low-temperature semiconductor phase, a band gap of approxi-
mately 0.6 eV opens up within the 3d bands, separating two filled bands from higher-lying empty bands.
The two absorption peaks at 0.85 and 1.3 eV are due to transitions from these two filled bands.
2. EXPERIMENTAL METHOD
IO'
The optical constants of VO2 were
ransmission studies on ng-
s. e single cr stals f E
ppie
1 d y H. T. Gu
.-.'-. "-.- . .
L bo
d o
as VO
to ies. Th ey were grown by meltin
-- s over th e melt. This
oitio of th VO h'
Chemical a al
'
h
F
o Io-P
tA
EA
w IP-&
temperature T is approximately'
&
Ch
cem~ a f' —
X
cm~ 2c7~ 6m~ 8 Ct' y IL
I- 0.4
'
sly mentioned orientations o
the previousl
p
ill ildo 1 two d't' istinct op tical sp ' g-
Thee crystals were oriented and m y po 0.2—
e a ~~c„g axis was arallel EXPERIMEN
of th t a1.
s. Th'is generally yielded a —— TRANSINISSI
f h 1 h 1 ESTIMATED 1F
FROM P 68OC
0 I I I
30 40 50 60 70 80 90 IOO
TEINPERATURE ( C)
l st
of the tetrag
ce, P. J.
agona l andd mono
E. N. Fuls, D. H. Hensler
Letters 10 199 (1967)
an,
ow them to be polycrystalline
a ine
pp. hys
790 VERLEUR, BARKER, AND BERGLUND
taneously with the transmission in a region adjacent to
6~ = 5. 54 6~=5.6 the infrared beam is also shown in Fig. 2.
S cu(eV) 1 s u(ev) 1 The reflection and transmission studies at near nor-
I.025 6.73 .3 5 I .884 5.82 .56 mal incidence were made with a single-beam grating
.895 4. I .45 .866 4.36 .39 spectrometer. The measurements were made point by
.794 3.62 .5 3.8 .365
.498 3.5 4 .482 3.42 .26 point with the conventional sample —aluminum-mirror
.387 2.67 .25 .49 2.97 .I 5
.795 1.82 .44 I. 56
I l. 5I .55 interchange for the reflection studies. The transmission
.78 I.33 .47 1.274 I. I 9 .53 studies of the thin films involved three measurements at
.96 I. I 9 .5 I.722 .96 .48
.95 .94 .4 l.99 .77 ~ 52 each frequency, viz. , 61m plus substrate, substrate only,
PLUS PHONON MODES PLUS PHONON MODES and air. Because of the relatively poor surface condi-
40— tions of the bulk samples (cracks and irregularities) as
compared to that of the thin Alms, the reference mirror
30— was formed by evaporating 2000 A of aluminum directly
over half the surface of the bulk crystals. In this man-
~ 20—
C3
V02 T& Tt ner, surface effects were minimized.
LLI
w
20—
IO—
0 0.5
I
I.O
I
I. 5 2.0
I I
2. 5
I
3.0
I
3.5 4.0
I
4.5
I
5.0
0 I I I I I lo +~~~a
0. 0.5 1.0 I.5 2.0 2.5 3.0 3.5 4.0 4.5 5.0
FREQUENCY (ev) FREQUENCY ( e V)
Fn. 4. ReQectivity data and classical oscillator Gt FIG. 5. Re6ectivity and transmission data and classical oscillator
for bulk VO2 at 355'K. its for a 1000 A, film of VO2 on sapphire at 300'K.
172 OPTI CAL P ROPE RTI ES OF VO
spectra were not different between the various bulk 0 05 I.O l. 5 2.0 2.5 3.0 3.5 4.0 4.5 5.0
FREQUENCY (eV)
crystals, the absolute level of the reQectivity varied by
as much as 10%%u~ between samples. Also, in the high- FIG. 7. Real part of dielectric constant e1 for VO2 at 300'K.
temperature spectra variations in the plasma edge from
one sample to the next by a similar percentage were
number of conduction electrons and m* the so-called
observed. While the latter could be attributed to dif-
optical mass of the electrons as defined by Cohen. ' The
ferent carrier concentrations of the various crystals, the
third term, which is a sum over Lorenz, or classical,
other discrepancies are not easily explained. The most
oscillators takes account of the remaining nonconstant
likely explanation is that surface irregularities and
contributions to the dielectric constant within the spec-
cracks are responsible for the variation in absolute
tral region of interest. These contributions are either
level of the reQectivities.
due to lattice vibrations or to interband transitions of
To extract the optical constants from the observed
bound electrons. In this paper the latter are of major
reAectivity and transmissivity spectra a classical oscil-
interest. While in the case of resonance absorption
lator fit was obtained for each spectrum. This method,
(lattice vibrations), the strength s„ frequency co, , and
made very convenient by the adoption of an automatic
linewidth I';, of the ith oscillator have some physical
curve-6tting computer program, has been extensively
significance, this in general is not true when Eq. (1) is
described elsewhere. ' It assumes that the complex
applied to the spectral region covering interband transi-
dielectric constant is given by the following well-known
tions. Any physical interpretations must be derived
dispersion relation:
from a direct study of the spectra.
Ss The classical oscillator its to the bulk-refIectivity
spectra are represented in Figs. 3 and 4 by the solid
and dashed curves, while the oscillator parameters are
listed in the figures. In terms of the dielectric constant,
The first term on the right represents a constant con- defined in Eq. (1), the refiectivity at normal incidence
tribution to the real part of the dielectric constant fram is given by the expression
high-frequency electronic transitions. The second term
gives the free-electron. contribution to the dielectric
constant. Here ~„= (4s.m, e'/rN*)'I' is the carrier density R((v) =
Qe(cu)+1
parameter and is related to the plasma frequency, and
~, =e/p, ~&m* is the collision frequency where m, is the The fitting procedure consists of an initial guess of the
number of oscillators and the value of each oscillator
parameter. The automatic curve-fitting program, start-
V02, I000A FILM, &&Tt
S ~(eV) 1
70- I.S 6
I .86 .95
.23
60- .28
.34
O
~ 50-
CO
Co 3eY
~ 40-
It Co
Z
~ 30— ~ 0 4— VOp, T&Tt
0-
I- ~o
2K E J. , BULK
—
I- 20- c( H
LLI O
& LLI
---- E II, BULK ~
FREQUENCY (eV) 0 0.5 I.O I.5 2.0 2.5 3.0 3.5 4.0 4.5 5.0
FREQUENCY (eV)
FIG. 6. Re6ectivity and transmission data and classical oscillator
Gts for a 1000 A. 61m of VO~ on sapphire at 355'K. FxG. 8. Real part of dielectric constant e1 for VOg at 355'K.
' Hans W. Verleur, J. Opt. Soc. Am. (to be published). ' M. H. Cohen, Phil. Mag. 3, 762 (1958).
VERLEU 2, BARKER, AN D BE RGLUN D
VOp, T&T)
.
r, = [(n, .—ik, ) —1]/[(n, —ik, )+1],
I- and
4
I=I
Z
+ I6—
I- ----- EE 2,II, BULK
BULK (14)
I- Co
CL Z
------' IOOOK FILM
&f c) I2
8—
ZO
I
~
n, = —
tLI
~ UJ
O
4vrk, /X, (17)
p ~~t I I I I I I I I
0 0.5 I.p I.5 2.0 2.5 5.0 3, 5 4.0 4.5 5.0 where d, and d~ are the thicknesses of substrate and
FREQUENCY (eV) film, respectively.
FIG. 9. Imaginary part of dielectric constant ~~ for VO2 at 300'K. Since n and k are defined in terms of the real and
imaginary parts of the dielectric constants by
ing with these initial parameters, which may be quite n= P(» '+» ')+»Q"' (18)
poor estimates, produces a final set which gives a best alld
fit to the experimental data. The real and imaginary k = »g/2n,
parts of the dielectric constants based on these best
fits are given by the solid and dashed curves in Figs. the fitting procedure starts again from the calculation
7—10. of Eq. (1) with a set of tria1 parameters.
The classical oscillator fits to the transmission and The transmission and reAection spectra of the film
reQection spectra of Figs. 5 and 6 were obtained in a were fitted simultaneously at each temperature with
similar manner. If it is assumed that the substrate is the same set of oscillators listed in Figs. 5 and 6. Since
sufliciently thick to neglect phase shifts due to multiple the solid curves fit the experimental data reasonably
reQections within it the transmissivity through film plus well, it may be concluded that the surface conditions
substrate is then given by of the film, which would effect the re6ectivity and trans-
missivity differently, are quite good. A poor optical.
T —TfTs p surface would not allow a simultaneous fit of the two
where spectra.
2
graf
The real and imaginary parts of the dielectric con-
Tf Ass
stants based on the classical oscillator fits of Figs. 5 and
1+r,rye"&
6 are given by the dotted curves in Figs. 7—10. Compar-
is the fraction of the incident intensity transmitted into ing the dielectric constants obtained from the two bulk
the substrate, and measurements, it can be seen that besides the anisot-
—(1 R )e &sss&s/(1 —R R e 2sss&s)
(g) ropy between the two polarizations there is relatively
poor agreement in amplitude between bulk and thin-
takes account of the additional losses in the substrate. film results. Yet similar structure appears in both the
The reRectivity of the two layers is, with the same thin-film and bulk spectra. These two observations to-
assumption regarding the substrate, gether with the already noted poor reproducibility of
R = Rrs+R the bulk measurements seem to suggest that surface
p ssss (6)
where effects, not corrected by the deposition of the reference
r~+r, e"J' mirror on the crystals, are responsible for the dis-
Rf- (7) crepancies. This problem has not been further examined
81+,e"& since the energy location and polarization dependence of
is the reRectivity of a film on an infinitely thick. sub- the structure appearing in these spectra is of primary
strate and concern. In Table I the frequencies of the peaks appear-
IJJ ~ ~ ~ ~ ~ ~
~ ~
— —
rr = [1 (nr ikr)]/[1+ (nr ikr)], — (11)
Cl
0
0 0.5 I.O I.5 2.0 2.5 3.0 3.5 4.0 4.5 5.0
— — — —
r, = [(nt ikr) —(n, ik, )]/[(nr ikr)+ (n, ik, )], FREQUENCY (eV)
(12) FrG. 10. Imaginary part of dielectric constant e2 for VO2 at 355'K.
OPTI CAL P ROPE RTIES OF VO2
TAnr. z I. Frequencies of peaks (eV) appearing in the spectra of IO6
the imaginary part of the dielectric constant.
T&Tg T&Tg E
—
---
Vop T&Tt
E J., SULK
ing in. the imaginary parts of the dielectric constants at E II ) SULK
4.0
P. J. Boddy, Phys. Rev. Letters 16, 688 (1966); A. Frova and
0 0.5 l. O I.5 2.0 2.5 3.0 3.5 4.5 S.O
P. J. Boddy, Phys. Rev. 153, A606 (1967).
FREQUENCY {eV) "A. H. kahn and A. J. Leyendecker, in Proceedings of the
SeventhInternational Conference on Semiconductors, Paris, 1904
Fxo. 11. Absorption coefBcient of VO2 at 300'K. (Academic Press Inc. , New York, 1964), p. 33.
VERLEUR, BARKER, AND BERGLUN D
20
RUTILE
297 K Cp
E II c EJc
20— — IO
EJ
IO
g
—0
SCALE
I
IO l5
eV
A. T& Tg ever, the latter is a very striking effect, and there are
several possible explanations. Lifetime broadening is
Figure 10 shows the imaginary part of the dielectric
probably the least likely explanation not only because
constant of VO2 at temperatures above 68'C. The ab-
of the very large broadening required (of order 1 eV),
sorption at photon energies below 2.5 eV is primarily
but also because there has been a signihcant loss of
due to free-carrier absorption and will be discussed
oscillator strength not expected from a simple lifetime-
later. However, the structure at photon energies above
broadening argument. A more likely explanation of the
2.5 eV is due to interband transitions, and it is believed
difference in the magnitude of the absorption is that the
that this absorption is due to transitions betm'een the
final states associated with the absorption peaks in
oxygen 2p bands and the empty vanadium 3d bands.
rutile are located in the lowest conduction band. Since
This conclusion is supported by comparing the energy
the lowest "conduction" band in VO~ is at least par-
location and polarization dependence of the absorption
tially occupied by the extra electron per vanadium ion,
near 3 eV in VO2 to the peaks labeled A in the optical
these transitions would not be allow'ed in VO2.
properties of rutile" (Fig. 14). Photoemission results
and a comparison of preliminary reQectivity measure- Cardona and Harbeke" have suggested that some of
ments of VO2 with rutile using unpolarized light up to the optical structure up to 10 eV in Ti02 may arise from
photon energies of 12 eV provides additional support exciton effects. Such effects would be expected to give
to this assignment. " rise to sharp structure near critical points as observed
near 4 eV. It is interesting to note that exciton eGects
There are two major diGerences between the peaks
located near 3 eV in VO2 and the peaks labeled A in would be suppressed due to the screening by the large
rutile shown in Fig. 14. First, they are located at ap- number of free carriers in VO2, and the lack of strong,
proximately 1 eV lower energy in VO2 and, secondly, sharp structure near 3 eV would be expected.
the structure in VO2 is not nearly as sharp or as strong Detailed assignments of the two clearly defIned peaks
as in Ti02. The former is not unusual since it is ex- in ~2 at 2.8 and 3.6 eV cannot presently be made. How-
pected that the energy separation between the titanium ever, it seems reasonable to conclude from the experi-
3d bands and the oxygen 2p bands in rutile will be mental data that the energy separation between the top
different than the energy separation between the vana- of the oxygen 2p bands and the vanadium 3d bands at
dium 3d bands and the oxygen 2p bands in VO&. How- the Fermi level is approximately 2.5 eV, and that the
two peaks are due to peaks in the joint density of states
'~ Manuel Cardona and Gunther Harbeke, Phys. Rev. 137, between these bands.
A1467 (1965).
0 R. J. Powell, Ph. D. thesis, Stanford University, 1967 (un- At photon energies below 2.5 eV, e2 exhibits behavior
published). characteristic of free-carrier absorption, but with an
VERLEUR, BARKE R, AN D BF RGl. UN D 172
I.O i-
VO, T&T
When VO2 is cooled through the tetragonal-mono-
clinic phase transition at 68'C, the optical properties
particularly in the infrared change markedly. It has
been shown previously' that most of these changes are
0.4 due to the onset of strong free-carrier absorption at
temperatures above T&. It may be of interest to attempt
0.2 to relate the free-carrier absorption through T& to the
electrical resistivity.
0
0 0.5 I.Q l.5 2.0 2.5 3.0 3.5 4.0 4.5 5.0 In Fig. 2 the transmission at he=0. 31 eV and the
FREQUENCY (eV)
resistivity of a thin VO2 film similar to that exhibiting
Fn. 15. Effective number of electrons per vanadium ion con- the optical properties shown in Figs. 5 and 6 are shown.
tributing to the optical absorption in VO2 at 355'K. Since the spectral dependence of the transmission shown
in Figs. 5 and 6 indicates that the absorption at hv
additional shoulder due to an absorption peak centered =0.31 eV is dominated by free carriers, it is possible
near 0.7 eV which is most clearly visible for light polar- to relate the curves of p and T in Fig. 2 by the following
ized perpendicular to the c axis. The carrier density simplified model. The density of carriers n, enters p as
parameter ~„and collision frequency co, are shown in 1/p=n, e'r/m*, where r is the low-frequency relaxation
Fig. 4 and are very similar to those measured and dis- time. e, also enters the dielectric function description
cussed in I. (Eq. 1) through the parameter ~„'=4mn, t,"/m*. Neg-
Philipp and Ehrenreich" have expressed the sum rule lecting changes of v and m* w'ith temperature, a relation
070 between or„and p can be written in the form
jeff (~o) (ue~((v) do), (20)
2m'Se' p
(21)
where or is the angular frequency of the light, nz is the where c is a constant. In Fig. 2, c has been chosen to fit
free-electron mass, e is the electronic charge, is the F both sets of data at 78'C.
number of atoms per unit volume, and K,« is the ef- Using the film-transmission formula given earlier,
fective number of electrons per atom contributing to the p(T) data in Fig. 2, and Eq. (21), the transmission
the optical absorption up to a frequency cop. For applica- at several temperatures for the heating run from 55 to
tion to VO2 it is more meaningful to define E as the 80'C has been calculated and is plotted as a dashed
number of vanadium ions per unit volume, in which curve in Fig. 2. This curve falls much more steeply than
case &,gg in Eq. (20) becomes the effective number of the observed transmission. The discrepancy probably
electrons per vanadium ion contributing to the comes from the infrared beam averaging over many
absorption. crystalline regions which do not all switch at 68'C. We
Figure 15 shows X,«determined from the optical can picture a few small regions spreading out and finally
data of VO2 in its high-temperature state. Near a photon engulfing the whole sample well above T, . (These par-
energy of 2.5 eV there is an abrupt increase in the slope tial switching effects have been studied by others. 4 The
of K,ff This behavior is consistent with the previously stresses built up in these small regions are probably also
described onset of interband transitions between the responsible at least in part for the hysteresis in the p
oxygen 2p bands and the vanadium 3d bands. If this and transmission curves. ) The observed transmission
absorption is subtracted from K,~g, the remainder con- change is then a measure of the film area that has
sists only of the absorption due to the one extra d elec- switched through T& and is not a measure of the number
tron per vanadium ion. Figure 15 indicates that the of carriers present at T&. Of course the resistivity itself
photon energy at which that part of X,«due only to suffers from the same mixed-phase problem: If a single
the extra electron per vanadium ion reaches its expected phase could be studied right up to T& the jump in p
value of unity is considerably larger than 2.5 eV. In would have been much steeper. It thus appears im-
fact X f f appears to saturate at a value near 0.3 at possible with the present samples and techniques to
2.5 eU. While it is difhcult to draw definite conclusions study optical excitation in VO2 in detail very near T&.
from these observations, the fact that interband transi- A similar conclusion on the presence of mixed phases
tions within the 3d bands are showing up in the data was reached previously. ' It can, how'ever, be concluded
(the shoulder in e2 near 0.7 eV) at photon energies well from Fig. 2 that the changes in the optical properties of
below 2.5 eV and the low value of K,«are both quali- VO2 occur with a few degrees of T&, and that the optical
tatively consistent with a model in which one or more properties are relatively insensitive to temperature well
of the 3d bands slightly overlap a lower, nearly filled above or w'ell below T, . This conclusion has been further
3d band. verified by preliminary measurements of VO2 reQectivity
"H. R. Philipp and H. Ehrenreich, Phys. Rev. 129, |550 at 90 K. The data are nearly identical to those at room
(1963). temperature.
OPT I CAL P ROP E RTI ES OF VO 797
C. T&Tg mately at twice the binding energy of the level, the "
energy gap in VO2 is approximately 0.6 to 0.7 eV.
Figure 9 shows the imaginary part of the dielectric
One other approach, and intuitively more satisfac-
constant for VO& measured, at 300'K. Above 2.5 eV,
tory, is to compare the absorption in UO2 to that of the
structure similar to that observed at 355'K and at-
V~ center in the alkali halides. '4 In the VI, center, a
tributed to transitions between the oxygen 2p bands
hole takes up an orbit on tw'o adjacent halogen ions
and the empty vanadium 3d bands is present. There is
forming a single ionized halogen "molecule. The "
a prominent peak for EJ a„ located at 3.0 eV, and tw'o formation of this center is accompanied by a lattice
less prominent peaks for Ej a located at 2.6 and 3.6 eV.
distortion, the two halogen ions moving closer to one
Although the polarization dependence of these peaks
another, and the complex is only stable at low' tem-
has changed somewhat compared to the high-tempera-
peratures. The analogy to the homopolar bond in VO&
ture data, they too are probably related to the peaks
described by Goodenough" is striking, and there is a
labeled A in rutile (Fig. 14).
strong similarity in the spectral dependence of the ab-
At photon energies below 2.5 eV, there is one promi- sorption. " The only major difference exists in the
nent peak in e2 at 0.85 eV for EJ a, and two peaks near polarization dependence of the absorption. In the alkali
1.0 and 1.3 eV for Ejj a . For neither polarization is there halides, the most prominent absorption is for light
a clear-cut onset of absorption as might be expected at polarized in the direction of alignment of the VJ,
a band edge. centers. In VO2, the homopolar bonds lie along the
There are several ways of examining the optical data rutile c axis, so that the dominant absorption might be
of monoclinic VO2 at photon energies below 2.5 eV, expected to be for Ejju„. Although there was some varia-
and none are completely satisfactory. If a band scheme tion in the magnitude of the absorption anisotropy in
is chosen as the basis for interpretation, it can only be
VO2, it was always found that the absorption was larger
concluded at the present time that the absorption peaks for EJ a . However, since the polarization d, ependence
near 1.0 eV and their polarization dependences must depends on the unknown spatial distribution of the
reQect joint density-of-states peaks and selection rules electron wave function, this difference may not be
between the empty and filled. vanadium 3d bands. significant.
However, the spectral dependence of the absorption
coeKcient below 1 eV shown in Fig. 11 is completely S. CONCLUSIONS
ambiguous as far as identification of the band-gap
energy is concerned since it is unlike that expected on The optical and energy band properties of VO2 at
a simple band picture. There is no clear threshold. The temperatures above 68'C have been discussed qualita-
absorption coefficient increases slowly from a value of tively in terms of the optical properties and electronic
approximately 10' cm ' near 0.2 eV to a value of 10' structure of rutile. Although the relatively limited
cm ' near 1.0 eV. For some samples an additional ab- understanding of rutile provides a severe restriction to
sorption peak of variable strength was observed near a detailed analysis of the UO2 data, several general
0.3 eV, which is believed to be due to impurities, im- conclusions are possible. It has been shown that the
perfections, or departures from stoichiometry. It is data are consistent with a model in which filled valence
possible that similar eGects have tended to mask and bands, probably associated primarily w'ith the oxygen
spread in energy the true band-edge absorption. Such a 2p orbitals, are separated by approximately 2.5 eV from
mechanism w'ould explain the weak temperature de- partially filled conduction bands. These conduction
pendence of this absorption down to 90'K. If this is bands probably arise primarily from the vanadium 3d
true, the energy gap in VO2 below 68'C is probably orbitals, and they are occupied only by the extra d
greater than 0.5 eV. electron of the vanadium ions. The data indicate that
Several of the theories presented to explain the semi- a large fraction of the states in the lowest d band are
conducting state of VO~ have postulated the existence occupied and that this lowest band, slightly overlaps
one or more partially occupied bands. For this reason
ion.'""
of a bound state for the extra d electron per vanadium
If this model is chosen as a basis for inter- it may be more accurate to consider the high-tempera-
ture state of VO2 as a semimetal rather than as a metal.
pretation of the optical data, it may be more reasonable
to compare the absorption below 2.5 eV to photo- At temperatures below 68'C, the optical properties
ionization from a deep impurity level. Referring to the indicate that the electrons responsible for the free-
absorption coefficient in Fig. 11, both the spectral de- carrier absorption at higher temperatures have either
pendence and the magnitude normalized by the density become trapped in localized levels or occupy two com-
of vanadium ions are very similar to that expected from pletely filled bands. In either case, an energy gap of
photo-ionization. " Using Lucovsky's result that the en- approximately 0.6 eV has formed between the highest
ergy at the absorption peak in photo-ionization from a
localized level to a band continuum occurs approxi-
"G. Lucovsky, Solid State Commun. 3, 299 (1965).
24
See, for instance, C. J. Debecq, B. Smaller, and P. H. Vuster,
Phys. Rev. 111, 1235 (1958); W. Konziz and Y. O. Woodruff,
"See, for instance, C. N. Berglund and H. J. Braun, Phys. Rev. J. Phys. Chem. Solids 9, 70 (1958); R. B. Murray and F. J. Keller,
164, 790 (1967), Phys. Rev. 137, A942 (1965).
VERLEVR, BARKER, AND BERGLUND 172
611ed states and the next higher empty conduction band. ized level has equal qualitative consistency with the
The major features of the previously identified absorp- data. It is more likely that neither model is completely
tion from the deeper oxygen 2p bands do not change, correct. Since the extra d electron per vanadium ion is
although relatively small changes in the energy loca- largely responsible for the crystal forces which result
tion and polarization dependence of the absorption in the distorted, monoclinic structure at temperatures
peaks were observed. below 68'C, effects in optical absorption similar to those
A more detailed comparison of the absorption due to observed in the Ii and VI, centers of the alkali halides
the extra d electron per vanadium ion at temperatures are expected to occur.
below 68'C to that expected on the basis of present
theories of the Inetal-semiconductor transition is in- ACKNOWLEDGMENTS
conclusive. Although it is clear that a simple band The authors wish to thank H. J. Guggenheim and
picture is qualitatively consistent not only with the D. H. Hensler for supplying the VO& crystals and films
measured optical properties but also the metal — semi- studied in this work, and G. E. Mahoney for making
conductor transition, there are indications that such a many of the measurements. Helpful comments and sug-
model may be a considerable oversimplification. In gestions from G. E. Smith and J. Brews, and very useful
addition, a model based on the assumption that the discussions about the band structure of VO2 with L.
extra d electron per vanadium ion is trapped in a local- Mattheiss are also greatfully acknowledged.
AND
VICTOR RKHN
Michetson Laboratory, China Lake, California 93555
(Received 2 October 1967; revised manuscript received 5 April 1968)
The technique of electroreRectance was applied to the study of epitaxial (Ga, In)As alloys. Two experi-
mental methods were used and their relative merits are discussed. The I'15-Fy and h. 3-A~ transitions and their
spin-orbit splittings were investigated as functions of alloy composition. The spin-orbit splitting at k=0 for
InAs at room temperature was measured directly as 0.446+0.008 eV. The electroreQectance linewidth
changes by a factor of 4 for the 1"»-Fj. series between InAs and GaAs. The broadening is discussed in terms
of mechanisms such as Geld inhomogeneity and light-hole lifetime for the InAs-rich alloys. The deviations
from a linear concentration dependence that were observed for all of the energy gaps were almost all identical
and were related to the virtual-crystal model. Transitions below the fundamental gap were correlated with
impurities by the use of photoluminescence measurements on the same samples.