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Technical Physics, Vol. 50, No. 4, 2005, pp. 528–530. Translated from Zhurnal Tekhnicheskoœ Fiziki, Vol.

75, No. 4, 2005, pp. 136–138.


Original Russian Text Copyright © 2005 by Kiselyova, Kitaev, Obolensky, Trofimov, Kozlov.

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Radiation Resistance of Advanced GaAs MESFETs


E. V. Kiselyova, M. A. Kitaev, S. V. Obolensky, V. T. Trofimov, and V. A. Kozlov
Lobachevski State University, ul. Ul’yanova 16, Nizhni Novgorod, 603950 Russia
e-mail: obolensk@rf.unn.ru
Received August 17, 2004

Abstract—The radiation resistance of GaAs MESFETs with a channel length of 30–80 nm is studied. It is
shown that the resistance is controlled by quasi-ballistic effects in the transistor channel and amounts to 5 ×
1014–5 × 1015 fast neutrons per square centimeter. © 2005 Pleiades Publishing, Inc.

It is known that linewidth shrinkage in semiconduc- charge region of the gate [9] and, hence, strongly
tor devices improves not only their high-frequency per- depends on the gate and drain voltages, the parameters
formance but also their radiation resistance. GaAs of ballistic motion and, accordingly, the radiation resis-
MESFETs can be grouped into three classes [1, 2] tance of the device depend on the constant supply volt-
according to the channel length: those where the chan- age (bias).
nel length (i) far exceeds the length of energy relaxation It was shown [8] that the distribution of radiation-
(>1 µm), (ii) is comparable to the length of energy induced defects in planar metal–semiconductor struc-
relaxation (0.2–1.0 µm), and (iii) is comparable to the tures is nonuniform because of metal atom injection
length of momentum relaxation (0.05–0.20 µm). The into the semiconductor under irradiation. Therefore, the
devices from the last-named class are recent advances, concentration and size of radiation-induced defect sub-
and their radiation resistance has not been explored so clusters are nonuniformly distributed over the active
far. layer of the device and the concentration of the subclus-
Neutron irradiation of GaAs generates radiation- ters in the channel may be several times higher than in
induced defect clusters consisting of 5–10 subclusters the substrate [8]. In this paper, it is proposed that an
[3, 4] with characteristic dimensions of 10–15 nm that Au/light metal/semiconductor composition be used in
are 10–40 nm apart. These clusters are completely non- order to increase the radiation resistance (Fig. 1).
transparent for thermal electrons, and hot electrons Importantly, the metal layer (Ti) adjacent to the semi-
(W = 0.3–1.0 eV) are scattered by individual subclus- conductor must have an atomic mass smaller than that
ters. Therefore, the transconductance of the current– of the semiconductor and the thickness of the metal
voltage characteristics of the FETs from the first class layer must exceed the range of the gold atoms, which
decreases in proportion to neutron fluence Fn, whereas gain energy from fast neutrons. In this case, the gold
for the FETs belonging to the second class, the atoms become embedded in the titanium layer under
transconductance drops in proportion to 3 F n [3, 5, 6]. irradiation and do not reach the GaAs layer, while the
In the devices from the third class, the radiation
resistance rises further due to the velocity burst effect
[7, 8]. In the case of short channels, the cross section of
scattering by subclusters decreases considerably: since Au Au
the energy of carriers reaches 1 eV [2], the space-
n+ n+
charge region of subclusters narrows and scattering
proceeds virtually on their cores [8]. The electrons n1
undergo mainly elastic small-angle scattering by impu-
rities, as well as by charged point radiation-induced
defects and subclusters [8]; i.e., the carriers become
almost insensitive to scattering centers. n2
The radiation resistance of MESFETs depends on a
n– 100 nm
number of parameters, specifically, carrier concentra-
tion, gate metal material, etc. [3, 5, 6]. In this paper, we
study the effect of neutron irradiation on the perfor- Fig. 1. Charge carrier motion in a V-groove-gate FET. n+ =
mance of ultrashort-channel MESFETs (belonging to 1019 cm–3; n1 = 2 × 1017 cm–3; n2 = (7–9) × 1019 cm–3; n− =
the third class). Since the channel length in such tran- 1014 cm–3. The dashed line is the boundary of the space-
sistors is determined as the doubled length of the space- charge region of the gate.

1063-7842/05/5004-0528$26.00 © 2005 Pleiades Publishing, Inc.


RADIATION RESISTANCE 529

Ti atoms injected into the semiconductor generate a Variation of the quasi-ballistic V-groove-gate MESFET
smaller number of radiation-induced defects than the parameters under neutron irradiation
atoms of the semiconductor itself.

capacitance, pF

at 37 GHz, dB

at 37 GHz, dB
In this work, we concentrate on devices with a

current*, mA
Source–gate

Gate–source

Noise factor
heavily doped active layer, (7–9) × 1017 cm–3, and con-

Gain factor
Device no.

voltage, V
1015 cm–2
Fluence,
sider their functioning as an attenuator (the source–

Drain
drain voltage is V12 = 0.1–0.3 eV) or as an amplifier
(V12 = 2.0–2.5 eV). For gate–source voltages V31 = 0.3–
0.4 V, drain–source voltages V12 = 0.1–0.2 V, and the 1 To 0.7 –0.97 11 0.083 6 3.3
doping level mentioned above, the channel length (esti- –0.97 6.5 0.067 6 4.9
mated as the doubled size of the space-charge region of
the gate) roughly equals 30 nm, which is two to four –0.64 10.1 0.078 5.5 3.6
times smaller than in the devices considered in [8]. 2 To 0.7 –0.21 12.6 0.095 6 3.4
With such voltages across the electrodes, intervalley +0.08 12.6 0.093 6 4.2
electron transitions are energetically forbidden, since 0 11.5 0.087 6 3.5
eV12 < WΓL, where WΓL is the energy gap between the Γ
and L valleys. –0.21 8.2 0.076 6 5
In the amplification mode, the channel length was 3 To 4 –0.3 14.2 0.098 6 3.2
80–100 nm. Owing to the high quality of the Schottky +0.44 9.3 0.085 6 4.1
barrier, a positive gate voltage up to 0.6 V increased the 0 4.5 0.067 5 3.4
gate current insignificantly (to 10–30 µA) with the –0.3 1.8 0.055 1.6 –
operating drain currents in the range 3–10 mA. This
made it possible to measure the high-frequency param- 4 To 4 –0.96 13.6 0.086 5.5 3.8
eters of the transistors in this regime. +0.07 13.6 0.103 6 5
The static and dynamic characteristics of the devices 0 12.6 0.095 5.8 4.5
were measured before and after exposure to neutron –0.96 1.6 0.034 1.2 –
radiation with a bell-shaped energy spectrum covering 5 To 6.5 –0.52 14.0 0.079 6.0 3.4
the range 0.01–3.0 MeV (the neutron mean energy was
+0.6 14.0 0.095 6 5.4
1.5 MeV). The fluence ranged between 1014 and 1.5 ×
1016 cm–2 (see table). The measurements are presented 0 7.3 0.067 5.5 4.8
in Fig. 2 and in the table. –0.52 2.2 0.045 2.1 –
The experimental data were processed using the 6 To 6.5 –0.95 10.7 0.078 5.5 3.3
models described in [4, 7]. The electron energy distri- 0 11.4 0.082 6 5.4
butions along the channel for various fluences and tran- –0.07 10.7 0.065 6 5
sistor’s operating modes were analyzed. Comparing the
calculated and experimental results leads us to the fol- –0.95 1.9 0.047 0.9 –
lowing conclusions. 7 To 15 0 10.1 0.078 6 4.2
(1) When the drain voltage decreases (Fig. 2), i.e., 0 0.8 0.023 1.1 –
when the amplification mode changes to the attenuation +0.59 5 0.056 4.2 5.7
mode, quasi-ballistic carrier motion (the velocity burst 8 To 15 –0.21 14.0 0.095 6 3.5
effect) takes place throughout the channel of the tran-
+0.63 14.0 0.092 6 3.8
sistor and the charge carrier energy in the channel var-
ies between 0.10 and 0.25 eV. The frequency of slow- 0 5.9 0.067 5 5.5
electron scattering by defect clusters is high, while the –0.21 2.2 0.043 0.5 –
radiation resistance estimated as the ratio of the drain * The drain voltage was taken from the range 2–3 V so as to min-
currents before and after irradiation (Fig. 2) is smaller imize the noise factor at a gain of 5.5 or 6.0 dB.
than in the case of high drain voltages.
(2) A high current density in the channel is related to
a high velocity of electrons after the velocity burst. At tor continues to efficiently operate up to a fluence of
the same time, the electron density in the channel is 1.5 × 1016 cm–2 in spite of the increase in the leakage
low, (1–5) × 1016 cm–2. When radiation-induced defects current. A self-bias circuit, which serves as a detector of
are generated, the channel is cut off, whereas the resis- the neutron radiation fluency, may be built around a
tance of the source and drain regions changes only voltage divider made of semiconductor and metallic
slightly. This effect allows restoration of both static and resistors incorporated into the transistor chip.
dynamic operating conditions of the transistor through
a decrease in the gate bias voltage (see the inset to (3) When the gate bias is fixed, the rate of the
Fig. 1 and table). At a gate voltage of 0.6 V, the transis- device’s performance degradation is proportional to the

TECHNICAL PHYSICS Vol. 50 No. 4 2005


530 KISELYOVA et al.

I2/I02 tion function after neutron irradiation, which is caused


I2, mA by the increase both in the rate of scattering by defects
1.0 1
8 and in the rate of intervalley transitions. The latter is
6
4
2 responsible for the enhancement of drain current fluc-
0.8
2 tuations, as well as for noise in the transistor.
3
0.6 0 1 2 3 a
V2, V ACKNOWLEDGMENTS
0.4 The authors are grateful to T.M. Agakhanyan,
b D.V. Gromov, V.T. Gromov, V.K. Kiselev, A.N. Ka-
0.2 chemtsev, and D.I. Tetel’baum for detailed discussion
of the results, as well as for valuable comments and
suggestions.
0 0.5 1.0 1.5 2.0
V2, V REFERENCES
1. M. S. Shur, GaAs Devices and Circuits (Plenum, New
Fig. 2. Relative variation of the drain current vs. the drain York, 1987; Mir, Moscow, 1991).
voltage after fast-neutron irradiation with fluences of (a) 5 ×
1014 and (b) 1015 cm–2. I0 is the drain current before irradi- 2. Yu. Pozhela, Physics of High-Speed Transistors (Mok-
slas, Vil’nyus, 1989) [in Russian].
ation. The inset shows the dependence of the drain current
on the drain voltage (1) before and (2, 3) after fast-neutron 3. E. R. Astvatsatur’yan, D. V. Gromov, and V. M. Lomako,
irradiation with fluences of 1015 cm–2 at gate voltages of Radiation-Induced Effects in GaAs Devices and Inte-
(1, 3) –1.25 and (2) –0.9 V. grated Circuits (Minsk. Gos Univ., Minsk, 1992) [in
Russian].
4. S. V. Obolenskiœ, Izv. Vyssh. Uchebn. Zaved. Élektron-
neutron fluence, as for the case of long-channel ika, No. 6, 67 (2002).
devices. However, the threshold fluence at which the 5. R. Zulig, in VLSI Electronics, Vol. 11: GaAs Microelec-
MESFET performance starts degrading is 1.5–3 times tronics, Ed. by N. C. Einspruch (Academic, New York,
higher. For fluences of up to 5 × 1015 cm–2, the effi- 1985; Mir, Moscow, 1988), pp. 501–547.
ciency of the transistor can be recovered by varying the 6. A. V. Bobyl’, R. V. Konakova, V. K. Kononov, et al., Ele-
gate voltage. At higher fluences, positive gate voltages ktron. Tekh., Ser. 8: Upr. Kachl. Stand., Nos. 4–5, 31
higher than 0.5–0.6 V could remedy the problem; how- (1992).
ever, the leakage current of the gate increases in this 7. N. V. Demarina and S. V. Obolenskiœ, Zh. Tekh. Fiz. 72
case. (1), 66 (2002) [Tech. Phys. 47, 64 (2002)].
(4) The gain can be completely recovered by vary- 8. S. V. Obolenskiœ, Mikroélektronika, No. 2, 153 (2004).
ing the gate voltage. At the same time, the minimal 9. N. A. Volchkov, K. S. Zhuravlev, M. A. Kitaev, et al., Izv.
noise factor is recovered to a value 10–30% higher than Ross. Akad. Nauk, Ser. Fiz. 68, 93 (2004).
that before irradiation (see table). This can be explained
by broadening the bell-shaped electron energy distribu- Translated by M. Lebedev

TECHNICAL PHYSICS Vol. 50 No. 4 2005