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I D , SAT =
kn W k W . .(VGS Vtn ) 2 = n . .(VD ,SAT ) 2 2 L 2 L kn W . .(VGS Vtn ) 2 .(1 + (VDS VDS , SAT )) 2 L
I D , SAT =
ro =
I D , SAT
1 L2 ; ro 2 L V DS , SAT
Triode (Linear) Region For a MOSFET where VGS Vt and VDS VGS Vt , the device acts as a voltage controlled resistor.
I D = kn .
For a PMOS:
ID = k . p
R 1 =
Rds =
1 k . p W .(VGS Vt ) L
k . p
' kn W (v gs + VGS VT ) 2 2 L
Transconductance This is the voltage-to-current gain in analog circuits. It is an AC small signal parameter.
gm = i D vGS
' = kn I D ,VGS @ biaspo int
W (v gs +VGS VT ) L
' g m = 2k n
W ID L
Lecture 1-1
D G S
g m v gs
S
g mb v SB
ro
OR
g mb =
g mb v BS
Design Practices for Device Sizing and Biasing: For analog design, we use L of at least 2 x minimum gate length. This is required for good output resistance and matching. For VDS , SAT , common practice is to choose around 5%-10% of VDD . For 2.5V design, around 125mV VDS , SAT is a good design practice. What happens to device parameters with temperature? The parameters that change with temperature are the mobility and threshold voltage.
kn =
n . ox where n is the mobility, ox is the oxide permittivity and tox is the oxide thickness. tox
Vtn 1mV / C T 3
1 Vtn . Vtn temperature co-efficient Vtn T Vtn (T ) = Vtn (To ).(1 + TCVtn .(T To )) TCVtn =
For a short channel device, TC of VTn is -2143 ppm/C. Mobility Degradation with Temperature:
(T ) = (T0 )(
Lecture 1-1
Iref
R Io
M1
kn W .( )1.(VGS 1 VT ) 2 .(1 + .(VDS1 VD ,SAT )) 2 L
M2
Vo
I REF =
IO I REF
Vtn = 0.8
Lecture 1-1
1. Vt Mismatch
IO I REF
1 + 2 .Vo 1 + 1.VDS 1
Biasing Current Mirrors The most common methodology is to use a known, robust current mirror to bias the mirrors.
M1
M2
Io Iref
6
Lecture 1-1