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Contents
Introduction
In order to make solar energy cost-competitive with other sources of energy (i.e. fossil fuels), reduction of the PV system cost is essential One path to reduce the cost is to reduce the raw material cost, by reducing the amount of silicon used for a wafer or by employing a lower quality of silicon, which is cheaper to produce The second path is increasing the solar system efficiency without significantly increasing the manufacturing cost
Introduction
Introduction
However, standard industrial solar cell efficiency is in the 16-18% range Main limitations of the high-efficiency structure:
Very expensive Very long fabrication process small output (five different photo-lithographic processes, eight high temp. processes!)
Introduction
Standard solar cell Selective emitter PERL
Aluminum back-surface-field
Introduction
The Aim:
[2-7]
Main limitation: A long high-temperature process is required to create the selective emitter.
Laser Doping
Creation of selective emitter without additional high temperature process 1968: Fairfield and Schwuttke laser doped diode Laser-induced diffusion:
Diffusion in the liquid phase Different dopant sources in gas, liquid and solid states
Laser Doping
p-type wafer
Emitter
Al BSF
Not to scale
Laser-Induced Defects
Bare Samples
SiNx Sample
Laser-Induced Defects
Bare Sample
SiNX Sample
Laser-Induced Defects
SON Sample
Laser-Induced Defects
Solar Cell Results:
Higher p-FFs were achieved for photoplated laser-doped solar cells p-FF is almost independent of laser diode current if photoplating is combined with a well-optimised Ni sintering In this case the solar cell is not limited by shunts
Conclusions
Selective emitter solar cell structure was developed, based on laser doping The laser doping method offers significant control on the junction parameters (sheet resistivity and junction depth) The dielectric layer and the plating method have a large impact on the solar cell performance Efficiency of 18.7% was achieved on commercial CZ wafers
Laser-Induced Defects
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