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Electron Microscopy
L. Russell
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y&v=1&bookid=25575
Final presentation
1.
2.
3.
Contents
Illuminating System
Specimen Manipulation System
Imaging System
Vacuum System
DEFECTS IN LENSES
Contents
MAGNIFICATION
DESIGN OF THE TRANSMISSION ELECTRON
MICROSCOPE
Alignment Theory
Major Operational Modes of the Transmission
Electron Microscope
High Contrast
High Resolution
Darkfield
Diffraction
INTRODUCTION
A TRANSMISSION ELECTRON MICROSCOPE, or
TEM, has magnification and resolution
capabilities that are over a thousand times
beyond that offered by the light microscope.
It is an instrument that is used to reveal the
ultrastructure of plant and animal cells as well as
viruses and may provide an image of the very
macromolecules that make up these biological
entities.
INTRODUCTION
The TEM is a complex viewing system equipped
with a set of electromagnetic lenses used to
control the imaging electrons in order to
generate the extremely fine structural details
that are usually recorded on photographic film.
Since the illuminating electrons pass through the
specimens, the information is said to be a
transmitted image.
The modern TEM can achieve magnifications of
one million times with resolutions of 0.1 nm.
10
11
12
Synonyms
Function of Components
Illumination
System
Page 167
Electron Gun
Gun, Source
Condenser Lens 1
Condenser Lens 2
C2, Brightness
Condenser
Aperture
C2 Aperture
13
Specimen
Manipulation
System
Specimen Exchanger
Specimen Stage
Stage
Objective Lens
Objective Aperture
Intermediate Lens
Diffraction Lens
Imaging System
P1
Projector Lens 2
P2
Same as P1
14
Observation
and Camera
Systems
Viewing
Chamber
Binocular
Microscope
Focusing Scope
Camera
15
Illuminating System
TABLE 6.4 Major Components on Control Panels of the TEM*
Component
Synonyms
Functions of Component
Filament
Emission
Bias
HV, kV Reset
HV, kV Select
Magnification
Control
MAG
Brightness
C2
Gun Tilt
Gun Horizontal
Spot Size
C1
Objective Stigmator
OBJ STIG
Corrects astigmatism
16
Focus Wobbler
Focus Aid
Exposure Meter
Vacuum Meter
VAC
Focusing Control
Focusfine, medium,
coarse
Brightness Center
Illumination Centration
Condenser Stigmator
COND STIG
Intermediate
Stigmator
INT STIG
Bright/Dark
Main
Main Evac
EVAC
HV Wobbler
HV Modulate
Objective Wobbler
OBJ MODUL
Illuminating System
18
Illuminating System
Electron Gun.
Within the electron gun (Figure 6.21), the filament
serves as the source of electrons.
The standard filament, or cathode (Figure 6.22), is
composed of a V-shaped tungsten wire approximately
0.1 mm in diameter (about the thickness of a human
hair).
Being a metal, tungsten contains positive ions and free
electrons that are strongly attracted to the positive ions.
Fortunately, it is possible to entice the outermost orbital,
or valence, electrons out of the tungsten by first
applying a high voltage to the filament and then heating
the metal by running a small amount of DC electrical
current through the filament while operating within a
vacuum.
19
Page 169
Figure 6.21
(A) Diagram of an electron gun showing
filament, shield, and anode.
The shield is connected directly to the
high voltage, whereas the high voltage
leading to the filament has a variable
resistor (VR) to vary the amount of high
voltage.
The output from the variable resistor is
then passed through two balancing
resistors (BR) which are attached to the
filament.
(B) Actual electron gun from TEM
showing filament (f), shield (s), and
anode (a).
Compare to line drawing in 6.21(A).
20
Figure 6.22
Standard V-shaped tungsten filament (f) used in most
electron microscopes. The filament is spotwelded to
the larger supporting arms, which pass through the
ceramic (c) insulator and plug into the electrical leads of
the gun.
21
Illuminating System
In other words, a certain amount of energy must
be put into the system to cause the electrons to
leave the filament.
The amount of energy necessary to bring about
electron emission is termed the work function of
the metal.
Although tungsten has a relatively high work
function, it has an excellent yield of electrons
just below its rather high melting point of 3,653
K.
22
Illuminating System
Figure 6.23
The importance of proper saturation of the filament is
shown in these two curves. (a) Solid line shows the
relationship between electron emission from a filament as
a function of the temperature of the filament. The
optimal temperature is 2,600 K. (b) When one exceeds
2,600 K filament temperature, the filament life drops
dramatically (dashed line).
24
Illuminating System
By examining Figure 6.23, it becomes apparent that a good electron yield is
achieved at 2,600 K where the filament life is around 100 hours.
Oversaturating the gun by heating the filament even 200 K beyond 2,600
K results in a dramatic decrease in filament life.
The average life of a filament ranges from 25 hours in older electron
microscopes to over 200 hours in microscopes with good vacuum systems
and scrupulously maintained gun areas.
The major causes of premature filament failure are:
oversaturation,
high voltage discharge caused by dirt in the gun region,
poor vacuum, and
air leaks or outgassing from contaminants in the gun chamber.
The two controls on the panel of the microscope that are used to initiate
the flow of electrons are usually labeled accelerating voltage (or possibly kV,
HV or HT) and emission or saturation (or sometimes filament).
25
Illuminating System
Illuminating System
Figure 6.21
(A) Diagram of an electron gun
Showing filament, shield, and
anode.
The shield is connected directly
to the high voltage, whereas the
high voltage leading to the
filament has a variable resistor
(VR) to vary the amount of high
voltage.
The output from the variable
resistor is then passed through
two balancing resistors (BR)
Which are attached to the
filament.
(B) Actual electron gun from TEM
showing filament (f), shield (s),
and anode (a).
Compare to line drawing in
6.21(A).
Page 169
28
29
Illuminating System
Illuminating System
31
Illuminating System
By varying the value of this resistor, the filament
may be made less negative than the shield
(usually by 100 to 200 volts). The greater the
value of the variable bias resistor, the less
negative the filament will become.
As the filament becomes less negative, fewer
electrons will be able to pass through the shield
aperture since they are now repulsed to a
greater degree by the shield.
The overall effect of the variable bias, therefore,
is to regulate the escape of electrons through
the shield aperture.
32
Illuminating System
Illuminating System
The so-called saturation point of the gun is the point where
the number of electrons emitted from the gun no longer
increases as the filament is heated.
The gun is, therefore, said to be self-biasing, since it throttles
back on electron emission as the heat is increased.
Illuminating System
Illuminating System
37
Illuminating System
Illuminating System
The choice of kV should be considered carefully.
Lower kVs such as 50 kV will generate an image
with higher contrast but lower resolution, while
higher kVs (100125 kV) improve resolution but
lower overall contrast.
Less specimen damage will result at the higher
kVs since the speedier electrons interact for
a shorter period of time with the specimen.
39
Illuminating System
Figure 6.25
Drawing of three different filament tips. (a) Standard V-shaped
filament tip. (b) Standard filament tip that was flattened and then
sharpened to a fine point. (c) Filament tip where a crystal of tungsten
was spotwelded onto the curved end.
41
42
Figure 6.26
Lanthanum hexaboride cathode. The crystal (C) is held in place by
means of pyrolytic graphite (G) blocks with compressive force
generated by molybdenum (M) alloy posts designed to withstand
extremely high temperatures.
43
Illuminating System
LaB6 filaments are coming into use slowly, since they are
considerably more expensive than tungsten filaments
and are extremely chemically reactive when hot. For the
latter reason, vacuums greater than 10-5 Pa are essential
(see section "Vacuum System"), and special filament
mounts must be constructed from such nonreactive
elements as rhenium or vitreous carbon.
LaB6 filaments are useful when small beam crossover
sizes containing large numbers of electrons are
necessary as in high magnification/resolution studies,
for elemental analysis, or in high resolution scanning
electron microscopy.
44
Illuminating System:
45
Figure 6.27
The field emission gun. Electrons are extracted
from a single crystal of tungsten by a series of
anodes that are made several thousand volts
positive. It is not necessary to heat this type of
filament.
46
Illuminating System:
47
TABLE 6.5 Comparison of the Three Major Filaments in Terms of Brightness, Page 172
Size of the Source Crossover, Energy Spread, Service Life, and Vacuum Required
Cold Field Emission
Lanthanum
Hexaboride
Tungsten
Filament
109
107
106
<10
104
>104
0.20.3
1.02.0
1.02.0
>2,000
1,0002,000
40100
10-8
10-5
10-3
48
Illuminating System
Condenser Lenses
50
Figure 6.28
The condenser lens system.
(A) In this mode, the 50 m gun
crossover is reduced to 5 m by
condenser lens 1, C1,
and then slightly enlarged by
condenser lens 2, C2, to yield a
10 m spot on the specimen
that is five times brighter than
the initial gun crossover.
51
Figure 6.28
52
Illuminating System-
Condenser Lenses
53
Illuminating System-
Condenser Lenses
54
Illuminating System
Condenser Lenses
Illuminating System
Condenser Lenses
56
Illuminating System
Condenser Lenses
Figure 6.29
Variable aperture holder from a TEM. The rod contains a molybdenum strip (m) with
apertures of various sizes.
Positioning screws (s) permit the precise alignment of the apertures in the electron
beam. An O-ring seal (o) permits the aperture to be sealed off inside the vacuum of
the microscope column. Insert shows enlargement of the molybdenum aperture strip
held in place by a brass retainer clip. Arrows point to apertures in the strip.
58
Illuminating System-
Condenser Lenses
60
62
Figure 6.30
(left) Short, top-entry grid holder for high contrast,
low-magnification work. Resolution is not as good with
this type of grid holder since the specimen is placed
higher in the objective lens, necessitating a longer focal
length of the lens. (right) Standard top-entry specimen
grid holder for high resolution work. The specimen grid
is placed on the end of the grid holder shaft and held in
place with a sleeve that is slipped over the shaft (arrow).
These holders are placed in the specimen stage with the
grids in the downward position in the polepiece.
63
64
65
Figure 6.31
Multiple grid holder specimen air lock. In this design, it
is possible to load six grid holders into the air lock,
evacuate the sealed chamber, select the holder, and
insert it into the column using the exchanger arm shown.
67
68
Figure 6.32
(A) Side-entry, multiple specimen grid
holder.
K = specimen selection knob for
positioning proper grid,
s = specimen holder area where
grids are inserted and held.
69
Special Stages
Imaging System
This part of the microscope includes the
objective, intermediate, and
projector lenses.
It is involved in the generation of the
image and the magnification and
projection of the final image onto a
viewing screen or camera system of the
microscope.
73
74
Objective Lens.
Objective Lens
The objective lens also initially magnifies the image
whereas other lenses are used to magnify the image
further.
Of all of the lenses used in the magnification of an image,
the objective lens is the least variable so that it can
maintain the very short focal lengths necessary for high
resolution and still be convenient to focus (i.e., if the
strength of the objective lens were varied over a wide
range, refocusing would require major adjustments of
the lens current to the lens).
Currently, as magnifications are changed, the
adjustments to the objective lens needed to bring the
image into focus are not excessive.
76
Objective Lens.
Because any fluctuations in either lens current or
high voltage would affect the focus of the
objective lens, both must be made extremely
stable.
Since contamination may introduce astigmatism
into any lens system, some way of minimizing
contamination in the objective lens is needed.
Such devices, called anticontaminators, are now
essential for high quality work.
77
Objective Lens.
Images are formed in the objective lens by a
"subtractive" action.
Depending on specimen thickness and density of
various parts of the specimen, some electrons
(inelastically scattered ones) will pass through
the specimen and into subsequent lenses with a
loss of some energy.
Other electrons may be deflected upon contact
with parts of the specimen and rendered unable
to enter the objective and other imaging lenses.
78
Objective Lens.
Still other electrons may lose all of their energy
upon impact with the specimen and are likewise
lost.
Most of the electrons that enter the objective
lens are ultimately projected onto the
phosphorescent viewing screen to cause a
certain level of brightness.
The more electrons passing through any one
point on the specimen, the brighter the image
generated.
79
Objective Lens.
Objective Lens.
Figure 6.33
Objective aperture located between
upper and lower parts of polepiece,
just under the specimen. The
Objective Lens.
Objective Lens.
Equation
l = wavelength of radiation
a = aperture angle
where
84
Objective Lens.
If we are using an accelerating voltage of 60 kV,
the wavelength of the electron is 0.005 nm.
A large 200 m aperture would generate an
aperture angle of illumination in the objective
lens of approximately 10-2 radians.
Upon substitution in the equation, we obtain a
depth of field of approximately 50 nm.
Now, if a 100 m aperture is used, the aperture
angle is approximately 10-3 radians, which yields
a 100 times greater depth of field of 5 m.
85
Objective Lens.
Consequently, when using smaller apertures in
both the objective and condenser lenses to
generate narrow aperture angles, the entire
depth of the specimen is in focus.
This is in contrast to the light microscope,
where larger aperture angles result in rather
narrow depths of field, making it necessary to
focus through the various levels to view the
entire depth in the specimen.
Depth of field and depth of focus are illustrated
in Figure 6.36, later in this chapter.
86
Figure 6.36
Depth of field (Dfi) occurs in the object plane,
Depth of focus (Dfo) refers to the depth in the image plane that is in
focus.
In the bottom figure, note that an aperture increases both the depth of
field and depth of focus.
87
Objective Lens.
88
Objective Lens.
Objective Lens.
After reaching a cherry red color, most
contamination will be evaporated and removed
by the vacuum system.
However, it may be necessary to repeat this
process several times.
One should not exceed the cherry red color,
since the molybdenum may weld onto the holder.
Platinum strips may be cleaned by passage
through a propane gas flame followed by
immersion in hydrofluoric acid and ammonium
hydroxide. Aperture strips are easier to clean if
contamination has not built up over time.
90
Objective Lens.
A thin foil aperture may also be used in the
objective or condenser lenses. Such apertures
are made of an extremely thin layer of gold and
are "self-cleaning."
In practice, one must regularly run the focused
electron beam over the rim of the aperture in
order to bake off the contaminants.
When such foils can no longer be cleaned using
such a procedure, they must be replaced.
91
93
Figure 6.34
Specimen anticontaminator or cold finger. The large container (c)
is filled with liquid nitrogen to chill the cold finger blade (b) that is
located just above and below the specimen.
An O-ring seals the apparatus from the atmosphere.
94
Astigmatism Correction
Astigmatism Correction
Figure 6.35
(A) Conceptual drawing of electromagnetic stigmator
showing orientation of eight electromagnets around the
lens axis. Strength and direction are controlled by
adjusting appropriate combinations of magnets to
generate a symmetrical field. The stigmator is located
under the condenser and the objective lens polepieces.
(B) Actual stigmator apparatus taken from an electron
microscope. The large arrow indicates one of the eight
electromagnetic iron slugs oriented around the central
axis. The entire apparatus fits up into the bore of the
objective lens so that the area indicated in the large
arrow is positioned just under the specimen.
The smaller arrow points out individual electrical
contacts through which current flows to energize the
electromagnets. The close-up photograph (bottom)
shows some of the electromagnets that are positioned
near the specimen (arrow).
97
98
Projector Lens
Projector Lens
Projector lenses are said to have great depth of
focus, meaning that the final image remains in
focus for a long distance along the optical axis.
This is determined by Equation 6.9
Equation 6.9: Depth of Focus
Projector Lens
Figure 6.36
Depth of field (Dfi) occurs in the object plane, while
depth of focus (Dfo) refers to the depth in the image plane that is in
focus.
In the bottom figure, note that an aperture
increases both the depth of field and depth of focus.
103
105
106
108
High Contrast
A constant problem with biological
specimens is their low contrast.
In the high contrast mode, the instrument
is adjusted to give contrast at the
expense of high resolution.
As a result, this mode is generally used at
magnifications under 50,000 X.
The conditions that may be changed to
enhance contrast are summarized below
109
110
Figure 6.30
(left) Short, top-entry grid holder for high contrast,
low-magnification work. Resolution is not as good with
this type of grid holder since the specimen is placed
higher in the objective lens, necessitating a longer focal
length of the lens. (right) Standard top-entry specimen
grid holder for high resolution work. The specimen grid
is placed on the end of the grid holder shaft and held in
place with a sleeve that is slipped over the shaft (arrow).
These holders are placed in the specimen stage with the
grids in the downward position in the polepiece.
111
113
114
115
High Resolution
Most of the conditions used to achieve
high resolution in the electron microscope
are the opposite conditions discussed
above for the high contrast mode.
Since contrast will be lacking in these
specimens, efforts should be made to
boost contrast using appropriate specimen
preparation and darkroom techniques, as
described in the previous section.
117
118
120
Darkfield
In the normal operating mode of the transmission
electron microscope, the unscattered rays of the beam
are combined with some of the deflected electrons to
form a brightfield image.
As more of the deflected or scattered electrons are
eliminated using smaller objective lens apertures,
contrast will increase.
If one moves the objective aperture off axis, as shown in
Figure 6.50, left, the unscattered electrons are now
eliminated while more of the scattered electrons enter
the aperture.
This is a crude form of darkfield illumination.
Unfortunately, the off-axis electrons have more
aberrations and the image is of poor quality.
124
Figure 6.50
Schematic diagram showing two ways of setting up
microscope for darkfield imaging: (left) displacement
of objective aperture off-axis; (right) tilt of illumination
system into on-axis objective aperture.
125
Darkfield
Higher resolution darkfield may be obtained by tilting the
illumination system so that the beam strikes the
specimen at an angle.
If the objective aperture is left normally centered, it will
now accept only the scattered, on-axis electrons and the
image will be of high quality (Figure 6.50, right).
Most microscopes now have a dual set of beam tilt
controls that will permit one to adjust the tilt for either
brightfield or darkfield operation.
After alignment of the tilt for brightfield followed by a
darkfield alignment, one may rapidly shift from one
mode to the other with the flip of a switch.
Both sets of controls also provide for separate stigmation
controls to correct for any astigmatism introduced by the
tilting of the beam to large angles.
126
Darkfield
The darkfield mode can be used to
enhance contrast in certain types of
unstained specimens (thin frozen sections)
or in negatively stained specimens.
An example of a darkfield image is shown
in Figure 6.51.
127
Figure 6.51
(top) Darkfield image obtained by tilting illumination system.
(bottom) Same specimen viewed in standard brightfield
mode. Specimen consists of inorganic salt crystals.
128
Diffraction
Diffraction
Since the crystalline lattice diffracts electrons to
form bright spots on the viewing screen (similar
to the mirrored rotating sphere sometimes used
in ballrooms to reflect a light source onto the
walls), the image will consist of a central, bright
spot surrounded by a series of spots, which are
the reflections.
The central bright spot represents nondiffracted
rays while the peripheral spots represent rays
diffracted at various angles.
130
Diffraction
Diffraction Practices
After the crystal is located (using the standard
bright-field imaging mode), the crystal is
centered on the viewing screen and the
objective aperture removed.
After placing the TEM in the selected area
diffraction (SAD) mode, an SAD aperture of the
appropriate size is inserted to select the area of
the crystal one wishes to diffract.
Focus sharply on the edge of the SAD aperture
using the SAD (intermediate lens) control.
132
Diffraction Practices
Diffraction Practices
Figure 6.52
Diffraction pattern obtained from polycrystalline
specimen showing characteristic ring pattern.
135
136
137
138
=h/mv
140
141
142
143
144
Figure 6.11
Single electron passing through
electromagnetic lens. Instead of traveling in a straight
line along the axis of the lens, the electron is forced by
the magnetic field to follow a helical trajectory that will
converge at a defined focal point after it emerges from
the lens. Therefore, electromagnets, which are DC
powered, behave similar to converging glass lenses.
145
Figure 6.12
A group of electrons originating from point A in the specimen plane
pass through an electromagnetic lens to all be focused at an
appropriate point (A') in the image plane.
The specimen is represented as the heavy arrow in this drawing.
The electromagnetic lens behaves as a thin biconvex glass lens as
shown in Figure 6.9.
147
150
152
Figure 6.13A
Diagram of electromagnetic lens showing
soft-iron casing (shroud) and soft-iron polepiece
that slips down inside bore of lens.
153
154
Figure 6.13B
155
Defects in Lenses
Figure 6.14
Astigmatism in a lens. Since the lens field is
asymmetrically weaker in the north/south plane, objects
oriented along the north/south axis will focus at a longer
distance. By contrast, due to a stronger east/west
lens field, objects oriented east/west will come to
focus at a shorter distance from the lens. The effect is
that only some portions of the image (either
north/south or east/west) will be in focus at one time.
Obviously, resolution will be degraded since the image
will be focused in only one plane.
157
Defects in Lenses
Figure 6.35
(A) Conceptual drawing of electromagnetic stigmator
showing orientation of eight electromagnets around
The lens axis. Strength and direction are controlled
By adjusting appropriate combinations of magnets
to generate a symmetrical field. The stigmator is
Located under the condenser and the objective lens
polepieces.
(B) Actual stigmator apparatus taken from an
Electron microscope. The large arrow indicates one
of the eight electromagnetic iron slugs oriented
around the central axis. The entire apparatus fits up
into the bore of the objective lens so that the area
indicated in the large arrow is positioned just under
the specimen.
The smaller arrow points out individual electrical
contacts through which current flows to energize
the electromagnets.
The close-up photograph (bottom) shows some of
The electromagnets that are positioned near the
Specimen (arrow).
159
Defects in Lenses
160
Defects in Lenses
Figure 6.15
Chromatic aberration in a glass lens. Different
wavelengths do not come to focus at the same point.
Note how the violet part of the spectrum (gray area)
focuses at a shorter distance than does the red part of the
spectrum. This results in an enlarged, unsharp point
rather than a smaller, focused one. Resolution of the
point will be degraded.
162
Defects in Lenses
Figure 6.16A
Chromatic aberration in an overly thick section
is evidenced by an image that is blurred overall due
to degraded resolution.
Figure 6.16B
Chromatic change of magnification occurs when
an overly thick specimen is viewed at low magnifications
with a low accelerating voltage. Only the central part of
the image is sharp since the effect is maximal at
the periphery.
164
Defects in Lenses
(Figure 6.16B).
This is because the lower energy electrons are imaged at a
different plane than the higher energy electrons.
The effect is maximal at the periphery of the image, since
these electrons are closer to the lens coils and, thus, are
more affected by the magnetic field.
This problem may be minimized by using thinner specimens,
higher accelerating voltages, higher magnifications, and by
correcting any other distortions that may be present in the
lens.
165
Defects in Lenses
166
Figure 6.17
(A) Spherical aberration in a lens.
Peripheral rays are refracted more than
central rays, so that all rays do not
converge to a common, small focal point.
Instead, an enlarged, diffuse spot like the
Airy disc will be generated.
The vertical line indicates the one point
where the point will be smallest (i.e.,
having the smallest circle of confusion).
(B) Correction of spherical aberration with
an aperture (here shown inside the lens)
to cut out peripheral rays and thereby
permit remaining rays to focus at a
common small imaging point.
Resolution will be improved since individual
Image points in the specimen will be
smaller.
167
Defects in Lenses
6.17B).
Although apertures must be used in the electron
microscope to reduce spherical aberration as much as
possible, they decrease the aperture angle and thereby
prevent the electron microscope from achieving the
ultimate resolving power specified in the equation for
resolution (Equation 6.1). r= 0.612 /n (sin )
In addition, the worsening of resolution as a result of
using a longer focal length lens is shown in Equation 6.5.
168
169
Defects in Lenses
Equation 6.5: Limit of Resolution, ds,
Imposed by Spherical Aberration
Ds = ks f 03
where k = a constant related to lens
characteristics
f = focal length of lens
= aperture angle of lens, normally the
objective lens
170
Defects in Lenses
From Equation 6.5, we see why a short focal
length lens combined with a smaller aperture (to
generate a smaller aperture angle) will help to
reduce the degradation of resolution caused by
spherical aberration.
Consequently, smaller apertures are generally
more desirable than larger ones to improve
resolutionin spite of the theoretical advantage
offered by large apertures as indicated in
Equation 6.1.
171
Defects in Lenses
Certain types of image distortions may arise
when spherical aberration occurs in the final
imaging (or projector) lenses of the transmission
electron microscope.
Since peripheral electrons are refracted to a
greater extent than central rays, the image
formed by these peripheral electrons will be at a
greater magnification and in a different focal
plane than the image generated from more
centrally positioned electrons.
172
Defects in Lenses
A grid of lines would not be imaged as square (Figure
6.18A), but would assume the shape of a sunken pillow,
hence the name pincushion distortion (Figure 6.18B).
This type of distortion may occur when attempting to
operate the transmission electron microscope at
excessively low magnifications.
Another type of imperfection, barrel distortion, occurs
when one attempts to use an electromagnetic lens in a
demagnifying mode rather than the normal magnifying
mode.
In this case, the central part of the image is magnified
more than the periphery so that the gridwork assumes a
swollen or barrel shape (Figure 6.18C).
173
174
Defects in Lenses
Defects in Lenses
Magnification
Besides forming images with high resolution, the
lenses of the electron microscope are able to
further magnify these images.
Magnification refers to the degree of
enlargement of the diameter of a final image
compared to the original.
In practice, magnification equals a distance
measured between two points on an image
divided by the distance measured between these
same two points on the original object, or
177
Magnification
178
Magnification
As will be discussed later, there are at
least three magnifying lenses in an
electron microscope: the objective,
intermediate, and projector lenses.
The final magnification is calculated as the
product of the individual magnifying
powers of all of the lenses in the system
as shown in Equation 6.6.
179
Magnification
Magnification
For example, if the transmission electron
microscope is operating in the high
magnification mode, typical values for the
respective lenses might be: 200 50 20
= 200,000.
If one were to operate the microscope in
the low magnification mode, perhaps the
values would be: 50 0.5 50 = 1.250.
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Magnification
Intermediate magnifications may be produced by varying
the current to the various lenses.
Sometimes, it is desirable to view as much of the
specimen as possible in order to evaluate quickly the
quality of the preparation or to locate a particular portion
of the specimen.
In this case, an extremely low magnification is obtained
by placing the microscope in the scan magnification
mode, which can be accomplished by shutting off the
objective lens and using the next lens (the intermediate
lens) as the imaging lens as follows: 1 0.5 100 = 50.
Of all the lenses used to change magnification, the
objective lens is used the least.
Normally it is maintained at around 50 or 100 while the
other lenses are varied.
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Magnification
Although it is theoretically possible to increase
the magnification indefinitely, the quality of the
image magnified is dependent on the resolving
power of the lenses in the system.
Consequently, the term useful magnification is
used to define the maximum magnification that
should be used for a particular optical system. It
is defined by the formula in Equation 6.7.
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Magnification
184
Magnification
Magnification
186
Magnification
All microscopes (including light microscopes)
must be calibrated in order to determine more
accurately the total magnification, since a
number of variables may cause the
magnification to vary by as much as 20 to 30%
over a short period of time.
Even modern instruments with direct reading
digital displays are guaranteed to be accurate to
only 5 to 10% of the stated values.
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Thank you!
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Checking Performance
Alignment
It is possible to check and make minor corrections to the
alignment of the electron microscope in less than 10
minutes, as follows:
Without a specimen in the TEM, verify that the filament
cloud is symmetrical, the condenser lens is stigmated,
and the C1 aperture is centered. Check that the C2
aperture is centered by varying the current to the C2
lens and observing that the illumination stays centered.
Insert a holey film and set the microscope at a low
magnification. Bring the illumination to the smallest
possible crossover spot size and then increase to the top
magnification. Both the illumination spot and the image
should stay close to the center of the screen.
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Checking Performance
Electrical Stability
Electrical Stability
Electrical Stability
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Image Drift
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Image Drift
The most common cause of image drift is a dirty
specimen holder.
All holders should be checked and cleaned on a routine
basis. Drift might also be caused by heating of the
specimen due to excessive beam irradiation, in which
case a smaller spot size, condenser aperture, or less
filament emission may be tried.
If the section or plastic substrate is not firmly attached
to the grid, it will move as the grid heats upthe
amount of movement is related to the beam intensity
and the area illuminated.
This may be confirmed by examining a test specimen
known to be thermally stable. Contamination in the area
above the specimen may lead to charging and shifting of
the image as the static is discharged.
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Image Drift
This should be suspected if the image shifts as
the C2 illumination level is changed. Moderate
drift of the specimen on the screen may be seen
through the viewing binoculars.
An easy way to test a specimen for drift is to
place a recognizable specimen structure next to
a fixed point on the viewing screen and observe
the movement of the specimen over an interval
2 to 3 times greater than the exposure time for
the negative.
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Image Drift
Figure 6.53
Drift in an electron microscope. Two exposures are
made on the same negative with an interval of 1 to 2
minutes between exposures. The rate of drift may be
calculated based on the distance moved over the
intervening time period.
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Contamination
Contamination
The contamination rate may be quantitated by doubleexposing a hole in a test specimen at a magnification of
250,000 as described in the previous paragraph. The
decrease in the diameter of the hole, by deposition of
contamination along the rim, is an excellent indicator of
the rate of contamination. A 2 to 3 minute exposure
should indicate a contamination rate of less than 0.01
nm per second with all anticontaminators in operation.
Without a specimen anticontaminator, the rates may be
ten times higher even in a clean microscope.
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Contamination
Magnification
Magnification
Magnification
After cleaning operations involving the
polepieces, specimen stage, or specimen
holders, magnifications should be
recalibrated.
Servicing of electronics may affect
magnifications if lens current or reference
circuits were repaired.
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Magnification
213
Magnification
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Magnification Calibration
Magnification Calibration
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Magnification Calibration
217
Magnification Calibration
where M = magnification
A = distance in mm between lines on
electron micrograph
B = number of spaces between lines
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Magnification Calibration
Magnification Calibration
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Magnification Calibration
Resolution
Most electron microscopes have a guaranteed
optimum resolution figure that was verified by
the manufacturer usually upon installation of the
microscope.
As long as one obtains satisfactory micrographs,
it may be mistakenly assumed that the resolving
power has not changed. One should be aware of
several methods to verify this, since the
degradation of resolving power may be so
insidious as to go unnoticed until the quality of
work is brought into question, perhaps to the
embarrassment of the microscopist.
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Figure 6.54
Magnification calibration standard. This series of micrographs are
of a standard diffraction grating containing
2,160 lines/mm. The magnifications were calculated to be
10,400; 21,000; and 30,200, respectively.
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Resolution
Resolution
225
Figure 6.55
Resolution standard, evaporated Pt/Ir film showing a
resolution of 0.4 nm at points circled. Magnification bar
= 50 nm.
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Resolution
Resolution
The Fresnel fringe method (Reisner, 1956) (Figures 6.57 and 6.58)
for calibrating resolution is undoubtedly the most convenient
method since the test specimen, a holey film, is readily available to
all microscopists. After correcting for astigmatism, the fringe is
focused as accurately as possible and a series of micrographs is
taken by varying the focus slightly between the various exposures.
The films are examined for that negative that shows the finest
fringe by being slightly overfocused. The fringe width is then
evaluated by measuring the distance from the center of the
overfocus fringe (e.g., the dark line on the negative) to the center
of the white space just inside of the dark line (Figure 6.57B). This
distance in nanometers is the resolving power of the instrument. Of
course, one must have a good magnification calibration in order to
determine the fringe width accurately. Since this method is based
on accurate stigmation and focusing of the microscope, an error of
20% is not unusual. However, with experience this simple method
may prove adequate for all but the most precise situations.
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Figure 6.56
Resolution standard, gold foil. The lattice spacings
show a resolution better than 0.204 nm. Final magnification
of print is 2.4 million times.
229
Figure 6.57
(A) Convenient resolution standard, Fresnel fringe
method. The fringe width is measured, based on known
magnification, and the finest fringe width measured
is equal to resolution. (B) Enlargement showing distance
to be measured indicated by arrowheads.
230
Figure 6.58
Positive print showing edge of holey film with Fresnel
fringe (white line, arrow) in overfocused condition.
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Shared Facilities
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