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RAMACHANDRAN . M
(2009206031)
M.E CIM (III Sem)
CHEMICAL ETCHING
Types of Etching:
Dry Chemical Etching
Wet chemical Etching
Applications:
Used in the Micro electronics industry
For highly anisotropic etching of
micron- or nano scaled structures.
Etch depths of hundreds of microns can be achieved with nearly vertical side
walls. This process is also called as Bosch process.
Bosch process has two different compositions of gases are alternatively used in
the reactor.
The first gas composition creates a polymer on the surface of the substrate.
A low temperature and low pressure plasma is maintained inside the ion
source.
The interface between ion source and chamber there are extraction grids
and a neutralizer.
Types
Reactive ion beam etching (RIBE)
Chemically Assisted Ion beam etching (CAIBE)
In RIBE , additionally a reactive gas is introduced to the ion source
and reactive ions are formed due to the collisons together with
neutral particles.
In CAIBE additonally , Argon gas was introduced into the chamber.
Kinetic energy of the ions and the current density can be controlled
independently.
The chamber may also used to perform RIE and simple sputter etching.
Sputter Etching
Types:
QUANTUM-CONFINED MATERIAL
levels
and
higher
energetic
separation
of
the
1. Quantum dots:
Semiconductor structure confined in all three spatial directions.
2. Quantum wires:
Structures being confined in two spatial directions and non- confined
in the third direction.
3. Quantum Wells:
Semiconductor structure being confined in one spatial direction and
non-confined in other two directions.
QUANTUM DOTS
Structure:
It consits of,
Core: The key material, defining the principal optical properties of the particles.
Shell: needed to protect the core from dissolving and from polluting outside
influences and prevents optically excited cores from relaxing radiationless.
Coating: To functionalize the particles and to make them accessible for further
chemical and biological use.
Cores:
The material used for the core is chosen based upon the emission
wavelength of interest, For e.g CdS for UV-blue, CdSe for most visible
spectrum.
For e.g Spherical CdSe cores of above 6nm dia emit at 655nm, whereas
smaller but otherwise equal cores of below 3nm will emit at 525nm.
Why shells?
Their emission is quite weak and often un realiable.
To improve radiation of the core material.
Un covered cores tend to spontaneously dissolve leading to irreversible
decomposition of the nano crystals.
Coating:
The hydrophobic part of the polymer binds the organic ligands, while the
hydrophilic interacts with the external solvent providing solubility in
buffers.
COLLOIDAL SYNTHESIS:
This method produce quasi-spherical and slightly rod like particles from
few molecules up to bulky semiconductor material.
The size range from 1nm to 6nm, which is hardly achievable by other
techniques.
These cover the surface of the nano particles and slow down the
reaction.
Adding to the colloidal solution a liquid, which is not able to solve the
nano particles, leads to successive precipitation of the particles
according to decreasing size.
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