VLSI Design

CMOS Transistor Theory

Outline
 Introduction  MOS Capacitor  nMOS I-V Characteristics  pMOS I-V Characteristics  Gate and Diffusion Capacitance  Pass Transistors  RC Delay Models

EE3: CMOS Transistor Theory 447 VLSI Design

Introduction
 So far, we have treated transistors as ideal switches  An ON transistor passes a finite amount of current

Depends on terminal voltages  Derive current-voltage (I-V) relationships  Transistor gate, source, drain all have capacitance  I = C ((V/(t) -> (t = (C/I) (V  Capacitance and current determine speed  Also explore what a degraded level really means


EE3: CMOS Transistor Theory 447 VLSI Design

MOS Capacitor
 Gate and body form MOS capacitor  Operating modes
  
Vg < 0 + polysilicon gate silicon dioxide insulator p-type body

Accumulation Depletion Inversion

(a)

0 < Vg < Vt + depletion region

(b)

Example with an NMOS capacitor

Vg > Vt + inversion region depletion region

(c)

EE3: CMOS Transistor Theory 447 VLSI Design

Terminal Voltages
 Mode of operation depends on Vg, Vd, Vs

Vg + Vgd Vd + Vgs = Vg Vs Vgs  Vgd = Vg Vd Vs  Vds = Vd Vs = Vgs - Vgd Vds  Source and drain are symmetric diffusion terminals  However, Vds u 0  NMOS body is grounded. First assume source may be grounded or may be at a voltage above ground.  Three regions of operation  Cutoff  Linear  Saturation
EE3: CMOS Transistor Theory 447 VLSI Design

nMOS Cutoff
 Let us assume Vs = Vb  No channel, if Vgs = 0  Ids = 0
Vgs = 0

+ -

+ d n+

Vgd

n+ p-type body b

EE3: CMOS Transistor Theory 447 VLSI Design

NMOS Linear
 Channel forms if Vgs > Vt  No Currernt if Vds = 0
Vgs > Vt

+ -

+ d n+

Vgd = Vgs

n+ p-type body b

Vds = 0

 Linear Region:  If Vds > 0, Current flows

Vgs > Vt

from d to s ( e- from s to d)  Ids increases linearly with Vds if Vds > Vgs Vt.  Similar to linear resistor

+ -

+ d n+

Vgs > Vgd > Vt Ids 0 < Vds < Vgs-Vt

n+ p-type body b

EE3: CMOS Transistor Theory 447 VLSI Design

NMOS Saturation
 Channel pinches off if Vds > Vgs Vt.  Ids independent of Vds, i.e., current saturates  Similar to current source

Vgs > Vt

+ -

+ -

Vgd < Vt

d Ids Vds > Vgs-V t

n+ p-type body b

n+

EE3: CMOS Transistor Theory 447 VLSI Design

I-V Characteristics
 In Linear region, Ids depends on
 

How much charge is in the channel How fast is the charge moving

EE3: CMOS Transistor Theory 447 VLSI Design

Channel Charge
 MOS structure looks like parallel plate capacitor while

operating in inversion  Gate oxide (dielectric) channel  Qchannel =

polysilicon gate W tox n+ L p-t pe od n+ SiO2 gate oxide (good insulator, Iox = 3.9)

+ + Vgd drain g source Vgs Vs Vd channel + n+ n+ Vds p-t pe od

gate Vg

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Channel Charge
 MOS structure looks like parallel plate capacitor while

operating in inversion  Gate oxide channel  Qchannel = CV  C=

gate Vg

polysilicon gate W tox n+ L p-t pe od n+ SiO2 gate oxide (good insulator, Iox = 3.9)

+ + Cg Vgd drain source Vgs Vs Vd channel + n+ n+ Vds p-t pe od

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Channel Charge
 MOS structure looks like parallel plate capacitor while

operating in inversion  Gate oxide channel  Qchannel = CV  C = Cg = IoxWL/tox = CoxWL  V = Vgc Vt = (Vgs Vds/2) Vt
polysilicon gate W

Cox = Iox / tox

g te Vg
g

t n+

s Vs
(g SiO2 g te xide d ins l t r, Iox = 3.9)

+ rce Vgs c + -

L p-t pe d

n+

Vgd dr in Vd nnel + n+ Vds d

p-t pe

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Carrier velocity
 Charge is carried by e Carrier velocity v proportional to lateral E-field

between source and drain  v = QE Q called mobility  E = Vds/L  Time for carrier to cross channel:


t=L/v

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NMOS Linear I-V

 Now we know

How much charge Qchannel is in the channel  How much time t each carrier takes to cross Qchannel I ds ! t W Vds ! QCox Vgs  Vt  V 2 ds L W F = ox V  V  Vds V ! F gs t 2 ds

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NMOS Saturation I-V

 If Vgd < Vt, channel pinches off near drain


When Vds > Vdsat = Vgs Vt

 Now drain voltage no longer increases

current V  V  Vdsat I ds ! F gs t 2 2 F V !  gs  Vt 2 V dsat

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NMOS I-V Summary

 Shockley 1st order transistor models (valid for

Large channel devices only)

I ds

0 F gs t F  gs  2

gs ds

cuto linear saturation

16

ds

ds

dsat

2 ds

"

dsat

EE3: CMOS Transistor Theory 447 VLSI Design

Example
 For a 0.6 Qm process (MOSIS site)

From AMI Semiconductor  tox = 100  Q = 350 cm2/V*s  Vt = 0.7 V  Plot Ids vs. Vds  Vgs = 0, 1, 2, 3, 4, 5  Use W/L = 4/2 P


2.5 2
Ids (mA)

Vgs = 5

1.5 1

Vgs = 4

Vgs = 3

0.5 0 0 1 2

Vgs = 2 Vgs = 1

3
Vds

3.9 y 8.85 1014 W W F ! Q Cox ! 350 8 L 100 10 L

W ! 120 Q A / V 2 L

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PMOS I-V
 All dopings and voltages are inverted for PMOS  Mobility Qp is determined by holes

Typically 2-3x lower than that of electrons Qn  120 cm2/V*s in AMI 0.6 Qm process  Thus PMOS must be wider to provide same current  In this class, assume Qn / Qp = 2


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Capacitance
 Any two conductors separated by an insulator have

capacitance  Gate to channel capacitor is very important  Creates channel charge necessary for operation  Source and drain have capacitance to body  Across reverse-biased diodes  Called diffusion capacitance because it is associated with source/drain diffusion

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Gate Capacitance
 Approximate channel as connected to source  Cgs = IoxWL/tox = CoxWL = CpermicronW  Cpermicron is typically about 2 fF/Qm

polysilicon gate W t n+ L p-t pe dy

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n+

i gate ide (good ins lator, Iox . I)

Diffusion Capacitance
 Csb, Cdb  Undesirable, called parasitic capacitance  Capacitance depends on area and perimeter
 

 

Use small diffusion nodes Comparable to Cg for contacted diff Cg for uncontacted Varies with process

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Pass Transistors
 We have assumed source is grounded  What if source > 0?


VDD

e.g. pass transistor passing VDD VDD

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NMOS Pass Transistors

 We have assumed source is grounded  What if source > 0? VDD  e.g. pass transistor passing VDD VDD  Let Vg = VDD  Now if Vs > VDD-Vt, Vgs < Vt Vs  Hence transistor would turn itself off  NMOS pass transistors pull-up no higher than VDD-Vtn  Called a degraded 1  Approach degraded value slowly (low Ids)  PMOS pass transistors pull-down no lower than Vtp  Called a degraded 0
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Pass Transistor Ckts

VDD VDD VDD VDD

VDD VDD

VDD VDD VSS

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Pass Transistor Ckts

VDD VDD Vs VDD-Vtn VDD-Vtn VDD-Vtn VDD VDD VSS VDD-Vtn VDD VDD

VDD VDD

Vs

|Vtp|

VDD-Vtn VDD-2Vtn

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Effective Resistance
 Shockley models have limited value

Not accurate enough for modern transistors  Too complicated for much hand analysis  Simplification: treat transistor as resistor  Replace Ids(Vds, Vgs) with effective resistance R  Ids = Vds/R  R averaged across switching of digital gate  Too inaccurate to predict current at any given time  But good enough to predict RC delay


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RC Delay Model
 Use equivalent circuits for MOS transistors

Ideal switch + capacitance and ON resistance  Unit nMOS has resistance R, capacitance C  Unit pMOS has resistance 2R, capacitance C  Capacitance proportional to width  Resistance inversely proportional to width

d s kC kC 2R/k g kC kC d d k s R/k g kC s kC d k s

ku

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RC Values
 Capacitance

C = Cg = Cs = Cd = 2 fF/Qm of gate width  Values similar across many processes  Resistance  R } 6 K;*Qm in 0.6um process  Improves with shorter channel lengths  Unit transistors  May refer to minimum contacted device (4/2 P)  Or maybe 1 Qm wide device  Doesnt matter as long as you are consistent

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Inverter Delay Estimate

 Estimate the delay of a fanout-of-1 inverter

2 Y 1

2 1

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Inverter Delay Estimate

 Estimate the delay of a fanout-of-1 inverter
2C R 2C 2C Y 1 C

2 Y 1

EE3: CMOS Transistor Theory 447 VLSI Design

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Inverter Delay Estimate

 Estimate the delay of a fanout-of-1 inverter
2C R 2C 2C Y 1 R C R C C C 2C

2 Y 1

2C

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Inverter Delay Estimate

 Estimate the delay of a fanout-of-1 inverter
2C R 2C 2C Y 1 R C R C C C 2C

2 Y 1

2C

d = 6RC
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